Takeyoshi Mimura

Main chain decomposable star shaped polymer for EUV resist

Jun Iwashita, Takeyoshi Mimura, Taku Hirayama, 2009, Advanced Lithography.

Examination of possible primary mechanisms for 193nm resist shrinkage

Takeyoshi Mimura, Lior Akerman, Guy Eytan, 2005, SPIE Advanced Lithography.

Resist development to improve flare issue of EUV lithography

Takeyoshi Mimura, Takeshi Iwai, Takako Suzuki, 2008, SPIE Advanced Lithography.

Dissolution kinetics and deprotection reaction in chemically amplified resists upon exposure to extreme ultraviolet radiation

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2009, Advanced Lithography.

Investigation of possible ArF resist slimming mechanisms

Takeyoshi Mimura, Lior Akerman, Ryusuke Uchida, 2006 .