Antonio Checco

Comparison of deposition techniques for Mo/Si reflective multilayers for EUV mask blanks

Kenji Yamamoto, Katrina Rook, Antonio Checco, 2021, Photomask Technology.

Antifogging abilities of model nanotextures.

Charles T Black, Christophe Clanet, David Quéré, 2017, Nature materials.

Directed Self‐Assembly of Block Copolymers on Two‐Dimensional Chemical Patterns Fabricated by Electro‐Oxidation Nanolithography

Soojin Park, Ji Xu, Antonio Checco, 2010, Advanced materials.