T. Chevolleau

Self-assembly patterning using block copolymer for advanced CMOS technology: optimisation of plasma etching process

T. Chevolleau, G. Cunge, M. Delalande, 2012, Advanced Lithography.

Study and optimization of the parameters governing the block copolymer self-assembly: toward a future integration in lithographic process

T. Chevolleau, X. Chevalier, R. Tiron, 2011, Advanced Lithography.