Peter D. Buck

发表

Adjustment of optical proximity correction (OPC) software for mask process correction (MPC). Module 1: Optical mask writing tool simulation

Gilles L. Fanget, Alexandra Barberet, Peter D. Buck, 2002, SPIE Photomask Technology.

Imaging properties of a leading-edge DUV laser generated photomask

Vishal Garg, Peter D. Buck, Curt Jackson, 2004, Photomask Japan.

Post apply bake optimization for 6025 masks

Peter D. Buck, Robert A. Holmstrom, 1997, Photomask and Next Generation Lithography Mask Technology.

Optical lithography simulation and photoresist optimization for photomask fabrication

Clifford L. Henderson, C. Grant Willson, Steven Scheer, 1999, Advanced Lithography.

Performance of the ALTA 3500 scanned-laser mask lithography system

Peter D. Buck, Thomas P. Coleman, Alex H. Buxbaum, 1998, Photomask and Next Generation Lithography Mask Technology.

DUV laser lithography for photomask fabrication

Vishal Garg, Peter D. Buck, Curt Jackson, 2003, SPIE Photomask Technology.

Investigation of a negative i-line resist with the CORE-2564 laser writer

Peter D. Buck, Brian J. Grenon, William A. Aaskov, 1994, Photomask Technology.

Role of mask acuity in advanced lithographic process design

Peter D. Buck, 2002, SPIE Advanced Lithography.

Integration of the Micronic Omega6500 into the mask manufacturing environment

Peter D. Buck, Vishal Garg, Johan Larsson, 2001, SPIE Photomask Technology.

Understanding CD error sources in optical mask processing

Peter D. Buck, 1993, Photomask Technology.

Comparison of DUV Wafer and Reticle Lithography: What is the Resolution Limit?

Christopher A. Spence, Cyrus E. Tabery, Peter D. Buck, 2002, Photomask Technology.

Plasma etching of Cr films in the fabrication of photomasks: II. a comparison of etch technologies and a first look at defects

Peter D. Buck, Thomas P. Coleman, David J. Johnson, 1996, Photomask Technology.

Enhancement of the image fidelity and pattern accuracy of a DUV laser generated photomask through next-generation hardware

Michael White, Vishal Garg, Peter D. Buck, 2004, SPIE Advanced Lithography.

Techniques for improving overlay on multilayer phase-shift masks

Peter D. Buck, Henry Chris Hamaker, Michael J. Bohan, 1994, Advanced Lithography.

Print characterization of photomasks from next-generation deep-ultra-violet laser pattern generator

Michael White, Vishal Garg, Peter D. Buck, 2005, Photomask Japan.

Phase-shift mask applications

Michael L. Rieger, Peter D. Buck, 1991, Other Conferences.

Mask data volume: explosion or damp squib?

Christopher A. Spence, Richard Gladhill, Peter D. Buck, 2005, SPIE Photomask Technology.

A new mask lithography tool for advanced mask manufacturing

Peter D. Buck, Brian J. Grenon, Henry Chris Hamaker, 1995 .

Characterization of an acetal-based chemically amplified resist for 257-nm laser mask fabrication

C. Grant Willson, Peter D. Buck, Benjamen M. Rathsack, 2001, SPIE Photomask Technology.

Performance of a new high-NA scanned-laser mask lithography system

Peter D. Buck, Henry Chris Hamaker, 1997, Photomask Technology.

Comparison of wet and dry chrome etching with the CORE-2564

Peter D. Buck, Brian J. Grenon, 1994, Photomask Technology.

Through pitch intensity balancing and phase error analysis of 193-nm alternating phase shift masks

Kent H. Nakagawa, Peter D. Buck, Gregory P. Hughes, 2004, SPIE Advanced Lithography.

DUV mask writer for BEOL 90-nm technology layers

Nazneen Jeewakhan, Peter D. Buck, Curt Jackson, 2003, SPIE Photomask Technology.

Adjustment of optical proximity correction (OPC) software for mask process correction (MPC): Module 2. Lithography simulation based on optical mask writing tool simulation

Gilles L. Fanget, Alexandra Barberet, Peter D. Buck, 2002, Photomask Japan.

GDS-based Mask Data Preparation Flow: Data Volume Containment by Hierarchical Data Processing

Peter D. Buck, Pat LaCour, Steffen F. Schulze, 2002, Photomask Technology.

Technical performance of the ALTA-3000 laser writer

Peter D. Buck, Brian J. Grenon, Henry Chris Hamaker, 1994, Photomask Technology.

Lithographic alternatives to PSM repair

Michael L. Rieger, Peter D. Buck, Mark Shaw, 1992, Advanced Lithography.

0.5-μm optical mask process for 364-nm scanned laser lithography

Peter D. Buck, 1990, Advanced Lithography.

Experimental characterization of constituent errors in electron-beam lithography

Tadashi Komagata, Yasutoshi Nakagawa, Peter D. Buck, 2006, Photomask Japan.

DUV laser lithography for photomask fabrication

Vishal Garg, Peter D. Buck, Curt Jackson, 2004, SPIE Advanced Lithography.

Optimizing the use of multipass printing to minimize printing errors in advanced laser reticle-writing systems

Peter D. Buck, Henry Chris Hamaker, Gary A. Burns, 1995, Photomask Technology.

Conversion from 50 KeV to DUV mask writer for 90-nm technology critical layers

Peter D. Buck, Yonghong Yang, Curt Jackson, 2004, SPIE Advanced Lithography.

Specifying phase-shift mask image quality parameters

Michael L. Rieger, Peter D. Buck, 1992, Other Conferences.

Advanced Write Tool Effects on 100-nm Node OPC

Kent H. Nakagawa, Peter D. Buck, Kent G. Green, 2002, Photomask Technology.

Plasma etching of chromium films in the fabrication of photomasks

Peter D. Buck, Thomas P. Coleman, 1995, Photomask Technology.