Stewart Wu

Better prediction on patterning failure mode with hotspot aware OPC modeling

Ir Kusnadi, Chih-I Wei, Yunfei Deng, 2021, Advanced Lithography.

Unsupervised machine learning based SEM image denoising for robust contour detection

Magdy Bayoumi, Germain Fenger, Sandip Halder, 2021, Photomask Technology.