Jun Huang

Mark design challenge of cut layer in FinFet

Yu Zhang, Lulu Lai, Yuyang Bian, 2021, Advanced Lithography.

The importance of in-die sampling using E-beam solution on yield improvement

Yaniv Abramovitz, Omri Baum, Yu Zhang, 2021, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.

Effects of lithography process conditions on unbiased line roughness by PSD analysis

Yujie Xu, Yu Zhang, Lulu Lai, 2021, Advanced Lithography.

Lithography PR profile improvement and defects reduction by film pre-treatment

Yu Zhang, Biqiu Liu, Xiaobo Guo, 2021, Advanced Lithography.