Stephan Martens

Novel method to find the best process point in e-beam mask making

Holger Sailer, Ulrich Hofmann, Nezih Unal, 2021, Photomask Japan.

A new approach to determine development model parameters by employing the isotropy of the development process

Joachim N. Burghartz, Mathias Irmscher, Corinna Kaspar, 2017 .