Chan-Uk Jeon

发表

Improving inspectability of sub-2x-nm node masks with complex SRAF

Wonil Cho, Jonghee Lee, Trent Hutchinson, 2013, Other Conferences.

EUV mask inspection study for sub-20nm device

In-kyun Shin, Gi-sung Yoon, Chan-Uk Jeon, 2012, Photomask Technology.

Computational technique to overcome the limit of a photomask writer

Jin Choi, Chan-Uk Jeon, In Kyun Shin, 2014 .

E-beam resist outgassing for study of correlation between resist sensitivity and e-beam optic contamination

In-kyun Shin, Hee Bom Kim, Chan-Uk Jeon, 2013, Photomask and Next Generation Lithography Mask Technology.

Multi-beam mask writer MBM-1000

Hirokazu Yamada, Sang-Hee Lee, Hiroshi Yamashita, 2017, Photomask Technology.

Mask Pattern Recovery Using Level Set Method and its Application on Defect Auto Disposition based on Simulated Aerial/Wafer Image

David Kim, Vikram Tolani, Jinhyung Park, 2009 .

Inverse e-beam lithography on photomask for computational lithography

Jin Choi, Chan-Uk Jeon, In Kyun Shin, 2013 .

Novel CD-SEM measurement methodology for complex OPCed patterns

Dong-Hoon Chung, In-kyun Shin, Takayuki Nakamura, 2014, Photomask and Next Generation Lithography Mask Technology.

The application of phase grating to CLM technology for the sub-65nm node optical lithography

Woo-Sung Han, Sung-Woon Choi, Chan-Uk Jeon, 2005, Photomask Japan.

Printability study of pattern defects in the EUV mask as a function of hp nodes

Kenneth A. Goldberg, Iacopo Mochi, Sungmin Huh, 2012, Advanced Lithography.

Study of high sensitivity DUV inspection for sub-20nm devices with complex OPCs

Chan-Uk Jeon, Sang Hoon Han, In-Yong Kang, 2014, Photomask Technology.

Progressive defects caused by crosstalk between mask fabrication processes

Chan-Uk Jeon, Byung-Gook Kim, Jaehyuck Choi, 2013, Photomask and Next Generation Lithography Mask Technology.

Challenges and technical requirements for multi-beam mask writer development

Jin Choi, Shuichi Tamamushi, Chan-Uk Jeon, 2014, Photomask and Next Generation Lithography Mask Technology.

A study on the ESD damage of a silicon oxy-nitride hard mask on the chromium surface of PSM blank

Hee-Bom Kim, Chan-Uk Jeon, In-kyun Shin, 2013, Photomask Technology.

New paradigm for effective particle removal cleaning of EUV mask

In-kyun Shin, Chan-Uk Jeon, Paul D. H. Chung, 2012, Other Conferences.

Manufacturability evaluation of model-based OPC masks

Seong-Woon Choi, Jung-Min Sohn, Hee-Sun Yoon, 2002, Photomask Technology.

Experimental study on the possibility of chemically amplified resists for mask production for device generations < 180 nm

Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, 2001, SPIE Photomask Technology.

Manufacturability of computation lithography mask: current limit and requirements for sub-20nm node

Jin Choi, Chan-Uk Jeon, In Kyun Shin, 2013, Advanced Lithography.

Extending DUV mask inspection tool for inspecting 2xnm HP and beyond

Dong-Hoon Chung, Lior Shoval, Dana Bernstein, 2013, Photomask and Next Generation Lithography Mask Technology.

Formation mechanism of the photomask blanks material related haze

Chan-Uk Jeon, Byung-Gook Kim, Ji-Young Lee, 2016, Photomask Japan.

Detectability and printability of EUVL mask blank defects for the 32-nm HP node

Kenneth A. Goldberg, Wonil Cho, Chan-Uk Jeon, 2007, SPIE Photomask Technology.

A novel design-based global CDU metrology for 1X nm node logic devices

Min-Ho Kim, Dong-Hoon Chung, Young-Keun Yoon, 2013, Photomask Technology.

Mask pattern recovery by level set method based inverse inspection technology (IIT) and its application on defect auto disposition

David Kim, Ki-Ho Baik, Vikram Tolani, 2009, Photomask Technology.

Inorganic resist materials based on zirconium phosphonate for atomic force microscope lithography

In-kyun Shin, Hee-Bom Kim, Chan-Uk Jeon, 2014, Advanced Lithography.

Implementation strategy of wafer-plane and aerial-plane inspection for advanced mask manufacture

Han-Ku Cho, Jay Han, John Miller, 2009, Photomask Japan.

Film loss-free cleaning chemicals for EUV mask lifetime elongation developed through combinatorial chemical screening

Uwe Dietze, Chan-Uk Jeon, Byung-Gook Kim, 2015, SPIE Photomask Technology.

Inspection of complex OPC patterns for 4x node and beyond

Chan-Uk Jeon, Sang Hoon Han, HanKu Cho, 2009, Photomask Technology.

Automated hotspot analysis with aerial image CD metrology for advanced logic devices

Young-Keun Yoon, Ute Buttgereit, Thomas Trautzsch, 2014, Photomask Technology.

The study on quantifiable analysis for complex OPCed patterns based on Mask CD SEM contour information

Takayuki Nakamura, Jun Matsumoto, Chan-Uk Jeon, 2016, Photomask Japan.

Durability of Ru-based EUV masks and the improvement

Jungyoup Kim, Hwan-Seok Seo, Chan-Uk Jeon, 2014, Advanced Lithography.

Effects of multilayer period on EUVL imaging for 2X node and beyond

Hwan-Seok Seo, Chan-Uk Jeon, Sang-Hyun Kim, 2013, Advanced Lithography.

Analysis of in-field uniformity on wafer considering exposure margin and MEEF

Woo-Sung Han, Hee-Sun Yoon, Chan-Uk Jeon, 2004, SPIE Photomask Technology.

EUV mask readiness for HVM (Conference Presentation)

Hee-Bom Kim, Dong-gun Lee, Hwan-Seok Seo, 2017 .

Deflector contamination in E-beam mask writer and its effect on pattern placement error of photomask for sub 20nm device node

Sung-Hoon Park, Jin Choi, Chan-Uk Jeon, 2012, Other Conferences.

The technical consideration of multi-beam mask writer for production

Jin Choi, Shuichi Tamamushi, Chan-Uk Jeon, 2016, Photomask Technology.

An analysis of correlation between scanning direction and defect detection at ultra high resolution

Han-Ku Cho, Dong-Hoon Chung, Chan-Uk Jeon, 2010, Photomask Technology.

Printability and inspectability of defects on EUV blank for 2xnm hp HVM application

Sungmin Huh, Jihoon Na, Jonggul Doh, 2012, Advanced Lithography.

EUV mask blank defect inspection strategies for 32-nm half-pitch and beyond

Hakseung Han, Stefan Wurm, Eric M. Gullikson, 2007, Photomask Japan.

A Study of Loading Effect during Electron-Beam Exposure and Etching Process in Photomask Fabrication

Ji-Hyeon Choi, Seong-Woon Choi, Jung-Min Sohn, 1999 .

Experimental verification of achieving vertical sidewalls for nanoscale features in electron-beam lithography

In-kyun Shin, Chan-Uk Jeon, Soo-Young Lee, 2014 .

Influence of a non-ideal sidewall angle of extreme ultra-violet mask absorber for 1 ×-nm patterning in isomorphic and anamorphic lithography

Hye-Keun Oh, Hee-Bom Kim, Chan-Uk Jeon, 2017 .