Wenwu Wang

发表

A Fast DCIV Technique for Characterizing the Generation and Repassivation of Interface Traps Under DC/ AC NBTI Stress/Recovery Condition in Si p-FinFETs

Eddy Simoen, Chao Zhao, Zhigang Ji, 2021, 2021 IEEE International Reliability Physics Symposium (IRPS).

Comparative Study on the Energy Distribution of Defects under HCD and NBTI in Short Channel p-FinFETs

Eddy Simoen, Zhigang Ji, Huaxiang Yin, 2021, 2021 IEEE International Reliability Physics Symposium (IRPS).

Investigation of Thermal Atomic Layer Deposited TaAlC with Low Effective Work-Function on HfO2 Dielectric Using TaCl5 and TEA as Precursors

Chao Zhao, Jinjuan Xiang, Jiahan Yu, 2017 .

Antireflection properties and solar cell application of silicon nanostructures

Tianchun Ye, Wei Chen, Chen Chen, 2011 .

Negative Bias Temperature Instability Characteristics and Degradation Mechanisms of pMOSFET with High-k/Metal Gate Stacks

Tianchun Ye, Bo Tang, Zhaoyun Tang, 2013 .

Study on characteristics of thermally stable HfLaON gate dielectric with TaN metal gate

Tianchun Ye, Zhengsheng Han, Qiuxia Xu, 2008 .

Energy distribution extraction of negative charges responsible for positive bias temperature instability

Tianchun Ye, Bo Tang, Zhaoyun Tang, 2015 .

Mitigation of Reverse Short-Channel Effect With Multilayer TiN/Ti/TiN Metal Gates in Gate Last PMOSFETs

Jing Xu, Xiaobin He, Qiang Xu, 2014, IEEE Electron Device Letters.

Impact of ALD TiN Capping Layer on Interface Trap and Channel Hot Carrier Reliability of HKMG nMOSFETs

Tianchun Ye, Bo Tang, Eddy Simoen, 2018, IEEE Electron Device Letters.

Investigation of TiAlC by Atomic Layer Deposition as N Type Work Function Metal for FinFET

Chao Zhao, Hushan Cui, Huaxiang Yin, 2015 .

Study of polycrystalline ZnTe (ZnTe:Cu) thin films for photovoltaic cells

Lianghuan Feng, Wenwu Wang, Wenwu Wang, 2007 .

Interface Study of ITO/ZnO and ITO/SnO2 Complex Transparent Conductive Layers and Their Effect on CdTe Solar Cells

Wei Li, Xing Zhang, Bing Li, 2013 .

Interface structure of HfNx/SiO2 stack grown by MOCVD using TDEAHf precursor

Toshihide Nabatame, Yukihiro Shimogaki, Wenwu Wang, 2005 .

Effect of Al-diffusion-induced positive flatband voltage shift on the electrical characteristics of Al-incorporated high-k metal-oxide-semiconductor field-effective transistor

Koji Akiyama, Akira Toriumi, Toshihide Nabatame, 2009 .

Physical understanding of different drain-induced-barrier-lowering variations in high-k/metal gate n-channel metal-oxide-semiconductor-field-effect-transistors induced by charge trapping under normal and reverse channel hot carrier stresses

Tianchun Ye, Bo Tang, Zhaoyun Tang, 2013 .

Novel GAA Si Nanowire p-MOSFETs With Excellent Short-Channel Effect Immunity via an Advanced Forming Process

Tianchun Ye, Junjie Li, Chao Zhao, 2018, IEEE Electron Device Letters.

Thermal Atomic Layer Deposition of TaAlC with TaCl5 and TMA as Precursors

Chao Zhao, Jinjuan Xiang, Wenwu Wang, 2016 .

Investigation of thermal atomic layer deposited TiAlX (X = N or C) film as metal gate

Chao Zhao, Huaxiang Yin, Jinjuan Xiang, 2016 .