Gioele Mirabelli

发表

Analysis of advanced technology nodes and h-NA EUV introduction: a cost perspective

Geert Hellings, Julien Ryckaert, Pieter Weckx, 2021, Photomask Technology.

Design-technology co-optimization of sequential and monolithic CFET as enabler of technology node beyond 2nm

Naoto Horiguchi, Julien Ryckaert, Pieter Weckx, 2021 .

Back-gated Nb-doped MoS2 junctionless field-effect-transistors

Felice Crupi, Paul K. Hurley, Ian M. Povey, 2016 .

Hall-effect mobility for a selection of natural and synthetic 2D semiconductor crystals

Paul K. Hurley, Ian M. Povey, Roger E. Nagle, 2017, 2017 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS).

Air sensitivity of MoS2, MoSe2, MoTe2, HfS2, and HfSe2

Paul K. Hurley, Ian M. Povey, Michael Schmidt, 2016 .