U. Weidenmueller
发表
C. Hohle,
R. Galler,
K.-H. Choi,
2011,
European Mask and Lithography Conference.
C. Hohle,
R. Galler,
K.-H. Choi,
2010,
Photomask Technology.
Yves Laplanche,
J. Todeschini,
Laurent Pain,
2003,
SPIE Advanced Lithography.
R. Galler,
M. Suelzle,
U. Weidenmueller,
2009,
Photomask Technology.
R. Galler,
M. Krueger,
L. E. Ramos,
2011,
Photomask Technology.
R. Galler,
M. Krueger,
L. E. Ramos,
2012,
European Mask and Lithography Conference.
Yves Laplanche,
M. Jurdit,
L. Pain,
2005
.
S. Manakli,
L. Pain,
U. Weidenmueller,
2008,
European Mask and Lithography Conference.
L. Pain,
U. Weidenmueller,
Serdar Manakli,
2009,
European Mask and Lithography Conference.
Harald Bosse,
C. G. Frase,
U. Weidenmueller,
2008,
SPIE Advanced Lithography.
U. Weidenmueller,
A. Stoeckel,
D. Melzer,
2010,
European Mask and Lithography Conference.
U. Weidenmueller,
Monika Boettcher,
Peter Hahmann,
2010
.