Christopher Dennis Bencher

发表

Gridded design rule scaling: taking the CPU toward the 16nm node

Huixiong Dai, Christopher Dennis Bencher, Yongmei Chen, 2009, Advanced Lithography.

Demonstration of 32nm half-pitch electrical testable NAND FLASH patterns using self-aligned double patterning

Ping Xu, Huixiong Dai, Chris Ngai, 2009, Advanced Lithography.

Self-aligned double patterning process for 32/32nm contact/space and beyond using 193 immersion lithography

Mehul Naik, James Yu, Christopher Dennis Bencher, 2010, Advanced Lithography.

APF pitch-halving for 22nm logic cells using gridded design rules

Michael C. Smayling, Huixiong Dai, Christopher Dennis Bencher, 2008, SPIE Advanced Lithography.

Special Section Guest Editorial: Alternative Lithographic Technologies

Christopher Dennis Bencher, Douglas J. Resnick, Ricardo Ruiz, 2014 .

Implementing self-aligned double patterning on non-gridded design layouts

Huixiong Dai, Chris Ngai, Jason Sweis, 2009, Advanced Lithography.

RET application in 45-nm node and 32-nm node contact hole dry ArF lithography process development

Chris Ngai, Christopher Dennis Bencher, Xiangqun Miao, 2007, SPIE Advanced Lithography.

Post-litho line edge/width roughness smoothing by ion implantations

Peng Xie, Huixiong Dai, Chris Ngai, 2013, Advanced Lithography.

Toward 22 nm: fast and effective intrafield monitoring and optimization of process windows and critical dimension uniformity

Jo Finders, Huixiong Dai, Chris Ngai, 2011 .

Decomposition strategies for self-aligned double patterning

Yunfei Deng, Harry J. Levinson, Huixiong Dai, 2010, Advanced Lithography.

Plasma damage monitoring for PECVD deposition: a contact potential difference study and device yield analysis

Chris Ngai, Christopher Dennis Bencher, Zhiwei Xu, 1998, Advanced Lithography.

45nm and 32nm half-pitch patterning with 193nm dry lithography and double patterning

Huixiong Dai, Chris Ngai, Christopher Dennis Bencher, 2008, SPIE Advanced Lithography.

Novel and cost-effective multiple patterning technology by means of invisible SiOxNy hardmask

Peng Xie, Huixiong Dai, Christopher Dennis Bencher, 2014, Advanced Lithography.

Self-aligned triple patterning for continuous IC scaling to half-pitch 15nm

Ping Xu, Chris Ngai, Yijian Chen, 2011, Advanced Lithography.

Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating

Wei Liu, Toshihiro Oga, Christopher Dennis Bencher, 2003, SPIE Advanced Lithography.

22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

Warren Montgomery, Huixiong Dai, Christopher Dennis Bencher, 2008, SPIE Advanced Lithography.

Directed self-assembly defectivity assessment. Part II

Ofir Montal, Kfir Dotan, Joy Cheng, 2012, Advanced Lithography.

Alignment and overlay improvements for 3x nm and beyond process with CVD sidewall spacer double patterning

Huixiong Dai, Chris Ngai, Christopher Dennis Bencher, 2009, Advanced Lithography.

Innovative self-aligned triple patterning for 1x half pitch using single "spacer deposition-spacer etch" step

Ping Xu, Christopher Dennis Bencher, Yongmei Chen, 2011, Advanced Lithography.

Understanding device impact of line edge/width roughness in frequency domain

Peng Xie, He Ren, Huixiong Dai, 2013, Advanced Lithography.

Double patterning compliant logic design

Yunfei Deng, Harry J. Levinson, Huixiong Dai, 2011, Advanced Lithography.

Small particle defect characterization on critical layers of 22nm Spacer Self-Aligned Double Patterning (SADP)

Chris Ngai, Saar Shabtay, Kfir Dotan, 2012, Advanced Lithography.

Tracking defectivity of EUV and SADP processing using bright-field inspection

Huixiong Dai, Chris Ngai, Kfir Dotan, 2014, Advanced Lithography.

Scatterometry characterization of spacer double patterning structures

Prasad Dasari, Jiangtao Hu, Oleg Kritsun, 2010 .

Template Patterning: Flexible Control of Block Copolymer Directed Self-Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning (Adv. Mater. 23/2012)

H.-S. Philip Wong, Huixiong Dai, Yongmei Chen, 2012 .