Hisako Aoyama

DFM for defect-free DSA hole shrink process

Shoji Mimotogi, Shimon Maeda, Satoshi Tanaka, 2014, Advanced Lithography.

Optimization of directed self-assembly hole shrink process with simplified model

Shoji Mimotogi, Satoshi Tanaka, Shimon Maeda, 2014 .

Leaking light through embedded shifter-type opaque ring for attenuated phase-shift mask

Shigeki Nojima, Hidehiro Watanabe, Hisako Aoyama, 1997, Photomask and Next Generation Lithography Mask Technology.

Control of morphological defects at the boundary between the periodic and non-periodic patterns in directed self-assembly process

Katsuyoshi Kodera, Simon Maeda, Masahiro Ohshima, 2016, SPIE Advanced Lithography.