Guy Dawson

Towards pure carbon: ultra-high carbon fullerene based spin-on organic hardmasks

Alan G. Brown, Guy Dawson, Alex L. McClelland, 2019, Advanced Lithography.

High-carbon fullerene based spin-on organic hardmask

Alan G. Brown, Guy Dawson, Tom Lada, 2018, Advanced Lithography.

Highly substituted fullerene-based spin-on organic hardmasks

Warren Montgomery, Alan G. Brown, Guy Dawson, 2020, Advanced Lithography.

Multi-trigger resist for electron beam lithography

John Roth, Yasin Ekinci, Guy Dawson, 2017, European Mask and Lithography Conference.

Multi-trigger resist patterning with ASML NXE3300 EUV scanner

Geert Vandenberghe, Danilo De Simone, John Roth, 2018, Advanced Lithography.

Multi-trigger resist for electron beam and extreme ultraviolet lithography

John Roth, Yasin Ekinci, Guy Dawson, 2018, European Mask and Lithography Conference.

Lamellar orientation of block copolymer using polarity switch of nitrophenyl self-assembled monolayer induced by electron beam

Takahiro Kozawa, Guy Dawson, Alex P. G. Robinson, 2017, Advanced Lithography.