J. Y. Chen

Chapter 2 - Current Trends in MOS Process Integration

Alan G. Lewis, J. Y. Chen, A. Lewis, 1989 .

High-density electron-beam-fabricated CCD memory components

J. G. Nash, R. C. Henderson, J. Y. Chen, 1980 .

Radiation Hardness on Submicron NMOS

J. Y. Chen, D. Patterson, R. Martin, 1981, IEEE Transactions on Nuclear Science.

Enhanced Radiation Effects on Submicron Narrow-Channel NMOS

R. C. Henderson, J. Y. Chen, J. Y. Chen, 1982, IEEE Transactions on Nuclear Science.

Punchthrough current for submicrometer MOSFETs in CMOS VLSI

J. Y. Chen, J. Zhu, R. Martin, 1988 .

Masked ion‐beam lithography: A feasibility demonstration for submicrometer device fabrication

J. Y. Chen, C. P. Minning, C. W. Slayman, 1981 .

Use of sacrificial spacers for fabricating LDD transistors in a CMOS process

J. Y. Chen, I. Wu, Tiao-Yuan Huang, 1986 .