Insung Kim

发表

The emergence of assist feature OPC era in sub-130nm DRAM devices

Byeong-soo Kim, Insung Kim, Gi-Sung Yeo, 2001 .

Investigation of EUV tapeout flow issues, requirements, and options for volume manufacturing

Insung Kim, Kevin Lucas, Munhoe Do, 2011, Advanced Lithography.

The lithography process design for 4Giga-bit DRAM of 0.31k1 with KrF

Byeong-soo Kim, Insung Kim, Gi-Sung Yeo, 2001 .

Stray-light implementation in optical proximity correction (OPC)

Insung Kim, Yong-Jin Chun, Young-Chang Kim, 2007, Photomask Japan.

Full field EUV lithography turning into a reality at IMEC

Kurt G. Ronse, Insung Kim, Alan Myers, 2007, Photomask Japan.

Lithography process design for 4-Gb DRAM of 0.31 K1 with KrF

Jung-hyun Lee, Byeong-soo Kim, Insung Kim, 2001, SPIE Advanced Lithography.

CD uniformity improvement for EUV resists process: EUV resolution enhancement layer

Insung Kim, Han-Ku Cho, Sumin Kim, 2011, Advanced Lithography.

Impact of illumination intensity profile on lithography simulation

Insung Kim, Han-Ku Cho, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Feasibility of very low k1(=0.31) KrF lithography

Byeong-soo Kim, Insung Kim, Jung-Hyeon Lee, 2000 .

Iot-Based Interactive Patient Identification and Safety Management System

Insung Kim, Jonghoon Chun, Jonghyun Lim, 2017 .

Mask characterization for CDU budget breakdown in advanced EUV lithography

Shawn Lee, Insung Kim, Greg Yang, 2012, Photomask Technology.

EUV lithography program at IMEC

Gian Francesco Lorusso, Frieda Van Roey, Insung Kim, 2007, SPIE Advanced Lithography.

One step forward to maturity of AF (assistant feature)-OPC in 100-nm level DRAM application

Jung-hyun Lee, Byeong-soo Kim, Insung Kim, 2002, SPIE Photomask Technology.

Mask characterization for critical dimension uniformity budget breakdown in advanced extreme ultraviolet lithography

Shawn Lee, Insung Kim, Greg Yang, 2013 .

The application criterion of model-based optical proximity correction in a low k1 process

Insung Kim, Han-Ku Cho, Joo-Tae Moon, 2004, SPIE Advanced Lithography.

Implementation of Software Source Code Obfuscation Tool for Weapon System Anti-Tampering

Insung Kim, Jaegwan Yu, Taekyu Kim, 2019, Journal of KIISE.

Assessment of full-chip level EUV optical correction for sub-40nm memory device

Insung Kim, Seongwoon Choi, Joo-on Park, 2009, Advanced Lithography.

Pattern type specific modeling and correction methodology at high NA and off-axis illumination

Insung Kim, Han-Ku Cho, Joo-Tae Moon, 2005, SPIE Photomask Technology.

Improving model-based OPC performance for sub-60nm devices using real source optical model

Insung Kim, Gi-Sung Yeo, Han-Ku Cho, 2006, SPIE Advanced Lithography.

Roughness of EUV resists exposed to EUV, ArF and KrF radiation as evaluated using three tools: spectroscopic ellipsometry, AFM and SEM

Insung Kim, Byong Chon Park, Yong Jai Cho, 2013, Advanced Lithography.

Comprehensive Approach to Determining the Specification for Mask Mean to Target

Jung-hyun Lee, Insung Kim, Han-Ku Cho, 2002, Photomask Technology.

Index for Efficient Ontology Retrieval and Inference

Insung Kim, Jonghoon Chun, Seungjae Song, 2013 .

Prospects of DUV OoB suppression techniques in EUV lithography

Insung Kim, Jeong-Ho Yeo, Hyun-Woo Kim, 2014, Advanced Lithography.

Way for LEEPL technology to succeed in memory device application

Insung Kim, Han-Ku Cho, Joo-Tae Moon, 2004, SPIE Advanced Lithography.

Methodology of flare modeling and compensation in EUVL

Insung Kim, Seong-Woon Choi, Woo-Sung Han, 2008, Lithography Asia.

A Fast Computation Method in Frequency Domain for Power Ground Plane Impedance Calculation Using the Mobius Transform

Insung Kim, Deukhyoun Heo, Youngsuk Suh, 2008, IEEE Transactions on Advanced Packaging.

A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns

Insung Kim, Han-Ku Cho, Joo-Tae Moon, 2004, SPIE Advanced Lithography.

An Improved Service Restoration Algorithm under Consideration of Abnormal Conditions in Distribution Automation Systems

Insung Kim, Sungwoo Lee, Namhun Cho, 2015 .

Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world

Jung-hyun Lee, Insung Kim, Gi-Sung Yeo, 2002, SPIE Advanced Lithography.

Use of CFRP to provide continuity in existing reinforced concrete members subjected to extreme loads

Insung Kim, Insung Kim, 2008 .

Progress in EUV lithography toward manufacturing

Insung Kim, Donggun Lee, Jihoon Na, 2017, Advanced Lithography.

Emergence of assist feature OPC era in sub-130-nm DRAM devices

Byeong-soo Kim, Insung Kim, Gi-Sung Yeo, 2001, SPIE Photomask Technology.

Status of EUV Resist and Process Development at IC Manufacture to Implement EUV Lithography to 2X DRAM and Beyond

Insung Kim, Han-Ku Cho, Cha-Won Koh, 2011 .

Anchorage of Carbon Fiber-Reinforced Polymer on Side Faces of Reinforced Concrete Beams to Provide Continuity

Insung Kim, Oguzhan Bayrak, James O. Jirsa, 2013 .

Dose performance characterization of extreme ultraviolet exposure system using enhanced energy sensitivity by resist contrast method

Insung Kim, Jae Won Hahn, Chang-min Park, 2016 .

Asymmetric bipolar resistive switching in solution-processed Pt/TiO2/W devices

Insung Kim, Hyunsang Hwang, Seungjae Jung, 2010 .

Model-based breakdown of resist and mask contributions to local CDU for sub-30-nm contact holes in EUV lithography

Insung Kim, Yeo Jeongho, Jae W. Hahn, 2014 .

Resistive switching mechanism of a Pr0.7Ca0.3MnO3-based memory device and assessment of its suitability for nano-scale applications

Insung Kim, Hyunsang Hwang, Xinjun Liu, 2011 .

Low temperature solution-processed graphene oxide/Pr0.7Ca0.3MnO3 based resistive-memory device

Insung Kim, Hyunsang Hwang, Seungjae Jung, 2011 .

Thermally assisted resistive switching in Pr0.7Ca0.3MnO3/Ti/Ge2Sb2Te5 stack for nonvolatile memory applications

Insung Kim, Hyunsang Hwang, Seungjae Jung, 2011 .