Takahiro Machida

Double patterning design split implementation and validation for the 32nm node

Vincent Wiaux, Eric Hendrickx, Staf Verhaegen, 2007, SPIE Advanced Lithography.

Immersion effects on lithography system performance

David Laidler, Philippe Leray, Shaunee Cheng, 2006, SPIE Advanced Lithography.

Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner

David Laidler, Shaunee Cheng, Koen D'havé, 2007, SPIE Advanced Lithography.

Controlling the Electronic Energy Structure of ZnS–AgInS2 Solid Solution Nanocrystals for Photoluminescence and Photocatalytic Hydrogen Evolution

Tatsuya Kameyama, Tsukasa Torimoto, Takahiro Machida, 2015 .