Karl Wimmer

Impact of photoresist taper and implant tilt angle on the interwell isolation of subquarter-micron CMOS technologies

William J. Taylor, Paul G. Y. Tsui, Percy V. Gilbert, 1997, Advanced Lithography.

Re-evaluating simple lambda-based design rules for low-K1 lithography process control

Kevin D. Lucas, Sergei V. Postnikov, Karl Wimmer, 2000, Advanced Lithography.

Monte Carlo method for highly efficient and accurate statistical lithography simulations

Kevin D. Lucas, Sergei V. Postnikov, Karl Wimmer, 2002, SPIE Advanced Lithography.

Process, design and optical proximity correction requirements for the 65nm device generation

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Model-based design improvements for the 100-nm lithography generation

Matthew A. Thompson, Sergei V. Postnikov, Karl Wimmer, 2002, SPIE Advanced Lithography.

Impact of optimized illumination upon simple lambda-based design rules for low-K1 lithography

Kevin D. Lucas, Sergei V. Postnikov, Karl Wimmer, 2001, SPIE Advanced Lithography.