S. Godny

Gate-all-around MOSFETs based on vertically stacked horizontal Si nanowires in a replacement metal gate process on bulk Si substrates

H. Mertens, R. Ritzenthaler, A. Hikavyy, 2016, 2016 IEEE Symposium on VLSI Technology.

Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control

Efrain Altamirano Sanchez, Philippe Leray, Shay Wolfling, 2016, SPIE Advanced Lithography.