Charles S. Dulcey

Twisted nematic device fabrication using photoalignment monolayers

Leonid A. Beresnev, Mu-San Chen, Charles S. Dulcey, 2004, SPIE Optics + Photonics.

Soft x-ray (14 nm) lithography with ultrathin imaging layers and selective electroless metallization

Franco Cerrina, Obert R. Wood, Charles S. Dulcey, 1993, Advanced Lithography.

193 nm lithography with ultrathin surface imaging resist systems

Mu-San Chen, Charles S. Dulcey, Jeffrey M. Calvert, 1993, Advanced Lithography.

Coplanar molecular assemblies of amino- and perfluorinated alkylsilanes : characterization and geometric definition of mammalian cell adhesion and growth

Charles S. Dulcey, James J. Hickman, Alan S. Rudolph, 1992 .

Mass spectrometric characterization of performance of a low-temperature oxidation catalyst

Charles S. Dulcey, James S. Horwitz, C. Dulcey, 1990 .

Deep ultraviolet patterning of monolayer films for high resolution lithography

Mu-San Chen, Charles S. Dulcey, Martin C. Peckerar, 1991 .

Deep‐UV Photochemistry and Patterning of (Aminoethylaminomethyl)phenethylsiloxane Self‐Assembled Monolayers

Mu-San Chen, Charles S. Dulcey, Walter J. Dressick, 2006 .

Coplanar patterns of self-assembled monolayers for selective cell adhesion and outgrowth

Charles S. Dulcey, Alan S. Rudolph, David A. Stenger, 1992 .