Rand Cottle
发表
Tejas K. Jhaveri,
Rand Cottle,
2003,
SPIE Advanced Lithography.
Nigel R. Farrar,
Chris Progler,
Yuan Zhang,
2004,
SPIE Advanced Lithography.
Yuan Zhang,
Guangming Xiao,
Rick Gray,
2005,
SPIE Advanced Lithography.
Peter Fiekowsky,
Rand Cottle,
C. C. Hung,
2001,
Photomask Japan.
Rand Cottle,
2002,
SPIE Photomask Technology.
Will Conley,
Jonathan Cobb,
Chris Progler,
2006,
SPIE Advanced Lithography.
Wenli Collison,
Christopher Borst,
Stock Chang,
2013,
2013 IEEE International Electron Devices Meeting.
Rand Cottle,
Nithin Yathapu,
Katherine Sieg,
2014,
25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014).
Will Conley,
Jonathan L. Cobb,
Chris Progler,
2006,
SPIE Advanced Lithography.
Rand Cottle,
John G. Maltabes,
R. Scott Mackay,
2005,
SPIE Photomask Technology.
Rand Cottle,
John G. Maltabes,
Scott Mackay,
2005,
SPIE Optics + Photonics.
Young-Mog Ham,
Daniel Ritter,
Rand Cottle,
2005,
Photomask Japan.
Will Conley,
Jonathan L. Cobb,
Michael Cangemi,
2004,
SPIE Advanced Lithography.
Yuan Zhang,
Guangming Xiao,
Rand Cottle,
2005,
SPIE/COS Photonics Asia.
Puneet Gupta,
Yuan Zhang,
Guangming Xiao,
2005,
Photomask Japan.
Tejas Jhaveri,
Christopher J. Progler,
Yuan Zhang,
2004,
SPIE Advanced Lithography.
Vicky Philipsen,
Pierre Sixt,
Marc Cangemi,
2006,
European Mask and Lithography Conference.
Chris Progler,
Marc Cangemi,
Rand Cottle,
2005,
SPIE Photomask Technology.
Will Conley,
Jonathan Cobb,
Chris Progler,
2004,
SPIE Advanced Lithography.