C. Wagner

EUV lithography: Lithography gets extreme

C. Wagner, N. Harned, 2010 .

Performance overview and outlook of EUV lithography systems

Marcel Beckers, Judon Stoeldraijer, Jo Finders, 2015, Advanced Lithography.

Performance optimization of MOPA pre-pulse LPP light source

Hans Meiling, Igor V. Fomenkov, Wayne J. Dunstan, 2015, Advanced Lithography.

Imaging enhancement (low k1 imaging) in EUV lithography: current status and future resolution enhancement techniques

C. Wagner, J. Finders, 2021 .

EUV lithography performance for manufacturing: status and outlook

Judon Stoeldraijer, Jo Finders, Hans Meiling, 2016, SPIE Advanced Lithography.