N. Harned

EUV lithography: Lithography gets extreme

C. Wagner, N. Harned, 2010 .

Performance overview and outlook of EUV lithography systems

Marcel Beckers, Judon Stoeldraijer, Jo Finders, 2015, Advanced Lithography.

Progress report: Engineers take the EUV lithography challenge

N. Harned, 2003 .

LPP EUV source readiness for NXE 3300B

Hans Meiling, Igor V. Fomenkov, Alex I. Ershov, 2014, Advanced Lithography.

Performance optimization of MOPA pre-pulse LPP light source

Hans Meiling, Igor V. Fomenkov, Wayne J. Dunstan, 2015, Advanced Lithography.

EXTATIC: ASML's α-tool development for EUVL

Hans Meiling, Peter Kuerz, Roland Geyl, 2002, SPIE Advanced Lithography.

EUV lithography: NXE platform performance overview

Guido Schiffelers, Judon Stoeldraijer, Hans Meiling, 2014, Advanced Lithography.

ASML's NXE platform performance and volume introduction

Guido Schiffelers, Judon Stoeldraijer, Hans Meiling, 2013, Advanced Lithography.