Thuc H. Dam

Impact of flare on source mask optimization in EUVL for 7nm technology node

Yayi Wei, Lisong Dong, Thuc Dam, 2020, Advanced Lithography.

A pH-sensitive nanotip array imaging sensor

Paul Pantano, Ying Hong Liu, Thuc H. Dam, 2000 .

Nanotip array photoimprint lithography

Paul Pantano, Thuc H. Dam, P. Pantano, 1999 .

Ab initio for design-technology co-optimization

S. Aboud, Thuc H. Dam, P. Asenov, 2021 .

Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)

Vikram Tolani, Guangming Xiao, Bob Gleason, 2008, Photomask Technology.

Logic Block Level Design-Technology Co-Optimization is the New Moore's Law (Invited)

Thuc Dam, Victor Moroz, Xi-Wei Lin, 2020, 2020 4th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).

Optimization from design rules, source and mask, to full chip with a single computational lithography framework: level-set-methods-based inverse lithography technology (ILT)

Vikram Tolani, Guangming Xiao, Bob Gleason, 2010, Advanced Lithography.