I. Mori

发表

Flare compensation for EUVL

Yukiyasu Arisawa, H. Aoyama, T. Uno, 2009, Advanced Lithography.

Novel piezoelectric-driven XYθ wafer table for an electron beam image projector

T. Tojo, Ichiro Mori, Toshiaki Shinozaki, 1985 .

A study of radiation damage in SiN and SiC mask membranes

I. Mori, Masamitsu Itoh, M. Hori, 1991 .

Fabrication of 70-nm-Pitch Two-Level Interconnects by using Extreme Ultraviolet Lithography

S. Saito, H. Aoyama, I. Mori, 2011 .

An electron beam image projection system with automatic wafer handling

I. Mori, K. Sugihara, M. Tabata, 1985 .

Maskless lithography using low-energy electron beam: Recent results for proof-of-concept system

I. Mori, H. Fujioka, T. Nakasugi, 2002 .

BEAM INDUCED DEPOSITION OF AN ULTRAVIOLET TRANSPARENT SILICON OXIDE FILM BY FOCUSED GALLIUM ION BEAM

I. Mori, Hiroko Nakamura, S. Inoue, 1996 .

Fabrication of 70-nm-Pitch Two-Level Interconnects by using Extreme Ultraviolet Lithography

S. Saito, H. Aoyama, I. Mori, 2011 .

Piezoelectrically driven XYθ table for submicron lithography systems

Toru Tojo, Ichiro Mori, Toshiaki Shinozaki, 1989 .

Advanced e‐beam lithography

T. Takigawa, Hirotsugu Wada, I. Mori, 1991 .

Optimization of optical properties for single-layer halftone masks

Hiroyuki Sato, Fumiaki Shigemitsu, Ichiro Mori, 1994, Advanced Lithography.

Development of core technologies on EUV mask and resist for sub-20-nm half pitch generation

I. Mori, Takeo Watanabe, H. Kinoshita, 2012 .