A. Wong

发表

Mask topography effects in projection printing of phase-shifting masks

A. Neureuther, A. Wong, 1994 .

Optical Imaging in Projection Microlithography

A. Wong, 2005 .

Rigorous Three-dimensional Time-do Ain Finite-difference Electromagnetic 1 P Simulation 1 Rigorous Three-dimensional Time-domain Finite-difference Electromagnetic Simulation Rigorous Three-dimensional Time-domain Finite-difference Electromagnetic Simulation Copyright 0 1994 Abstract Rigorous Three-d

A. Neureuther, A. Wong, 2022 .

Two-dimensional Electromagnetic Simulation of Topography Scattering and Diffraction for Optical Lithography

A. Neureuther, A. Wong, 2016 .

Optical Proximity Correction

Alfred K. K. Wong, A. Wong, 2001 .

Resolution and Image Enhancement

A. Wong, 2005 .

Imaging of Extended Objects with Finite Sources

A. Wong, 2005 .

Lithographic comparison of assist feature design strategies

Lars W. Liebmann, Alfred K. K. Wong, Scott M. Mansfield, 2000, Advanced Lithography.

Feasibility of 50-nm device manufacture by 157-nm optical lithography: an initial assessment

A. Wong, Pong Wing Tai, 2002, Proceedings 2002 IEEE Hong Kong Electron Devices Meeting (Cat. No.02TH8616).

Alternating phase-shifting mask design for low aberration sensitivity

G. Y. Mak, E. Lam, A. Wong, 2005 .

Title Computation lithography : Virtual reality and virtual virtuality

E. Lam, A. Wong, 2009 .

Lithographic evaluation of a DUV carbon attenuated phase shift mask

David S. O'Grady, S. Purushothaman, A. Wong, 1998 .

TCAD development for lithography resolution enhancement

Lars Liebmann, William C. Leipold, Mark A. Lavin, 2001, IBM J. Res. Dev..

Standard cell design with resolution-enhancement-technique-driven regularly placed contacts and gates

Edmund Y. Lam, Jun Wang, Alfred K. K. Wong, 2005 .

MEF revisited: low k1 effects versus mask topography effects

Alfred K. K. Wong, Christophe Pierrat, A. Wong, 2003, SPIE Advanced Lithography.

Quantification of image quality

Alfred K. K. Wong, Pong Wing Tat, A. Wong, 2002, SPIE Advanced Lithography.

The mask error factor in optical lithography

Alfred K. K. Wong, R. A. Ferguson, S. M. Mansfield, 2000 .

Alternate rigorous method for photolithographic simulation based on profile sampling

Joerg Bischoff, Alfred K. K. Wong, Bernd H. Kleemann, 1996, Advanced Lithography.

Rigorous three-dimensional time-domain finite-difference electromagnetic simulation

Andrew R. Neureuther, Alfred K. K. Wong, A. Neureuther, 1995 .

Polarization and edge effects in photolithographic masks using three-dimensional rigorous simulation

Andrew R. Neureuther, Alfred K. K. Wong, A. Neureuther, 1994, Advanced Lithography.

Effects of absorber topography and multilayer coating defects on reflective masks for soft x-ray/EUV projection lithography

Khanh Nguyen, Andrew R. Neureuther, David T. Attwood, 1993, Advanced Lithography.

Edge effects in phase-shifting masks for 0.25-µm lithography

Andrew R. Neureuther, Alfred K. K. Wong, A. Neureuther, 1993, Photomask Technology.

Polarization effects in mask transmission

Alfred K. K. Wong, Andrew R. Neureuther, A. Neureuther, 1992, Advanced Lithography.

Massively parallel electromagnetic simulation for photolithographic applications

Alfred Kwok Kit Wong, Roberto Guerrieri, Andrew R. Neureuther, 1995, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

Optimum mask and source patterns to print a given shape

Kafai Lai, Scott J. Bukofsky, Alfred K. K. Wong, 2001, SPIE Advanced Lithography.

Nebulous hotspot and algorithm variability in computation lithography

Edmund Y. Lam, Alfred K. K. Wong, E. Lam, 2010 .

Resolution enhancement techniques in optical lithography

Alfred Kwok-Kit Wong, A. Wong, 2001 .

Robust mask design with defocus variation using inverse synthesis

E. Lam, A. Wong, Ningning Jia, 2008, Lithography Asia.

Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography.

Stanley H. Chan, Edmund Y Lam, Alfred K Wong, 2008, Optics express.

Level-specific lithography optimization for 1-Gb DRAM

Alan C. Thomas, Richard A. Ferguson, Alfred K. K. Wong, 2000 .

Regularization of inverse photomask synthesis to enhance manufacturability

Edmund Y. Lam, Alfred K. K. Wong, Ningning Jia, 2009, Lithography Asia.

Computation lithography: virtual reality and virtual virtuality.

Edmund Y. Lam, Alfred K. K. Wong, E. Lam, 2009, Optics express.

Model-assisted routing for improved lithography robustness

Vivek Raghavan, Alfred K. K. Wong, Tim Kong, 2007, SPIE Advanced Lithography.

Microlithography: Trends, Challenges, Solutions, and Their Impact on Design

Alfred K. Wong, A. Wong, 2003, IEEE Micro.