B. Rathsack

发表

Graphoepitaxial assembly of cylinder forming block copolymers in cylindrical holes

Benjamen M. Rathsack, Brandon L. Peters, B. Rathsack, 2015 .

Resolution–linewidth roughness–sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist

Joshua S. Hooge, A. V. Pret, B. Rathsack, 2011 .

Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists

Christopher L. McAdams, William H. Heath, Peter I. Tattersall, 2004 .

Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition

Benjamen Michael Rathsack, B. Rathsack, 2001 .

Resists for Mask Making

B. Rathsack, C. Willson, D. R. Medeiros, 2005 .

EUV RLS performance tradeoffs for a polymer bound PAG resist

Alessandro Vaglio Pret, Roel Gronheid, Kathleen Nafus, 2010, Advanced Lithography.

Driving DSA into volume manufacturing

Seiji Nagahara, Kathleen Nafus, Shinichiro Kawakami, 2015, Advanced Lithography.

Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes

J. Andres Torres, Yuri Granik, Germain Fenger, 2014, Advanced Lithography.

DSA hole defectivity analysis using advanced optical inspection tool

Makoto Muramatsu, Jason Sweis, Seiji Nagahara, 2013, Advanced Lithography.