P. V. van Adrichem

Characterization and control of dynamic lens heating effects under high volume manufacturing conditions

S. Hunsche, G. Vandenberghe, P. van Adrichem, 2011, Advanced Lithography.

Freeform illumination sources: an experimental study of source-mask optimization for 22-nm SRAM cells

G. Vandenberghe, J. Finders, S. Verhaegen, 2010, Advanced Lithography.

EUV source-mask optimization for 7nm node and beyond

Paul van Adrichem, Thijs Hollink, Stephen Hsu, 2014, Advanced Lithography.

Investigation into a prototype extreme ultraviolet low-n attenuated phase-shift mask

Jo Finders, Paul van Adrichem, Cheuk-Wah Man, 2021 .

Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node

Linard Karklin, Vicky Philipsen, Rik M. Jonckheere, 2002, SPIE Advanced Lithography.

EUV source optimization driven by fundamental diffraction considerations

Jo Finders, Paul van Adrichem, Eelco van Setten, 2017, Photomask Technology.