S. Sriraman

发表

Coarse master equation from Bayesian analysis of replica molecular dynamics simulations.

I. Kevrekidis, G. Hummer, S. Sriraman, 2005, The journal of physical chemistry. B.

Overview of atomic layer etching in the semiconductor industry

R. Gottscho, S. Sriraman, V. Vahedi, 2015 .

Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions

S. Sriraman, M. Kushner, Chad Huard, 2017 .

Atomic-scale analysis of fundamental mechanisms of surface valley filling during plasma deposition of amorphous silicon thin films

E. Aydil, S. Sriraman, D. Maroudas, 2005 .

Coarse nonlinear dynamics and metastability of filling-emptying transitions: water in carbon nanotubes.

Ioannis G Kevrekidis, Gerhard Hummer, I. Kevrekidis, 2005, Physical review letters.

Hydrogen-induced crystallization of amorphous silicon thin films. I. Simulation and analysis of film postgrowth treatment with H-2 plasmas

E. Aydil, S. Sriraman, D. Maroudas, 2006 .

Mechanism and activation energy barrier for H abstraction by H(D) from a-Si: H surfaces

E. Aydil, S. Sriraman, D. Maroudas, 2002 .

Mechanisms and energetics of SiH3 adsorption on the pristine Si(0 0 1)- (2×1) surface

E. Aydil, S. Sriraman, D. Maroudas, 2001 .

Hydrogen-induced crystallization of amorphous Si thin films. II. Mechanisms and energetics of hydrogen insertion into Si–Si bonds

E. Aydil, S. Sriraman, D. Maroudas, 2006 .

Mechanism and energetics of dimerization of SiH2 radicals on H-terminated Si(0 0 1)-(2×1) surfaces

E. Aydil, S. Sriraman, D. Maroudas, 2003 .

Investigation of feature orientation and consequences of ion tilting during plasma etching with a three-dimensional feature profile simulator

S. Sriraman, M. Kushner, Yiting Zhang, 2017 .

Surface processes during growth of hydrogenated amorphous silicon

E. Aydil, S. Sriraman, D. Maroudas, 2004 .

Growth and characterization of hydrogenated amorphous silicon thin films from SiH2 radical precursor: Atomic-scale analysis

E. Aydil, S. Sriraman, D. Maroudas, 2004 .

Atomic-scale analysis of deposition and characterization of a-Si: H thin films grown from SiH radical precursor

E. Aydil, S. Sriraman, D. Maroudas, 2002 .

Evolution of structure, morphology, and reactivity of hydrogenated amorphous silicon film surfaces grown by molecular-dynamics simulation

E. Aydil, S. Sriraman, D. Maroudas, 2001 .

In situ probing and atomistic simulation of a-Si:H plasma deposition

E. Aydil, S. Sriraman, D. Maroudas, 2001 .

Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features

S. Sriraman, M. Kushner, Yiting Zhang, 2017 .

Transient behavior in quasi-atomic layer etching of silicon dioxide and silicon nitride in fluorocarbon plasmas

S. Sriraman, M. Kushner, A. Paterson, 2018, Journal of Vacuum Science & Technology A.

Control of ion energy and angular distributions in dual-frequency capacitively coupled plasmas through power ratios and phase: Consequences on etch profiles

S. Sriraman, M. Kushner, Yiting Zhang, 2015 .

Abstraction of hydrogen by SiH radicals from hydrogenated amorphous silicon surfaces

E. Aydil, S. Sriraman, D. Maroudas, 2000 .

Mechanism of hydrogen-induced crystallization of amorphous silicon

Eray S. Aydil, Dimitrios Maroudas, Sumit Agarwal, 2002, Nature.

Visualizing the evolution of surface bond straining during radical-surface interactions in plasma deposition processes

E. Aydil, S. Sriraman, D. Maroudas, 2002, IEEE Transactions on Plasma Science.