W. D. Meisburger

Low‐voltage electron‐optical system for the high‐speed inspection of integrated circuits

W. D. Meisburger, A. Brodie, A. Desai, 1992 .

Space-charge-induced aberrations

Roger Fabian W. Pease, G. I. Winograd, W. D. Meisburger, 1999 .

Prospects for charged particle lithography as a manufacturing technology

R. Fabian Pease, Liqun Han, G. I. Winograd, 2000 .

Application of the SEMSpec electron-beam inspection system to in-process defect detection on semiconductor wafers

Alan D. Brodie, T. R. Cass, W. D. Meisburger, 1996 .

Requirements and performance of an electron‐beam column designed for x‐ray mask inspection

Alan D. Brodie, W. D. Meisburger, A. A. Desai, 1991 .

Conceptual models for understanding and minimizing Coulomb interactions

A. D. Brodie, W. D. Meisburger, 1992 .

Distributed axis electron beam technology for maskless lithography and defect inspection

R. Fabian Pease, T. R. Groves, D. S. Pickard, 2003 .