Hideaki Tsubaki

Materials and Processes of Negative Tone Development for Double Patterning Process

S. Tarutani, Hideaki Tsubaki, Sou Kamimura, 2009 .

Development of Materials and Processes for Double Patterning toward 32 nm Node ArF Immersion Lithography

S. Tarutani, Hideaki Tsubaki, S. Kanna, 2008 .

Characterizing Polymer bound PAG Type EUV Resist

S. Tarutani, Hideaki Tsubaki, Hidenori Takahashi, 2011 .

Study on the Material Design for LWR Improvement

Hideaki Tsubaki, Tsukasa Yamanaka, Fumiyuki Nishiyama, 2007 .

Resist Materials Design to Improve Resolution and Sensitivity in EUV Lithography

Hideaki Tsubaki, Tomotaka Tsuchimura, Tooru Tsuchihashi, 2009 .