Weilun Chao

发表

Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab

Farhad Salmassi, Carl Cork, Wenhua Zhu, 2019, Advanced Lithography.

EUV imaging with a 13nm tabletop laser reaches sub-38 nm spatial resolution

Erik H. Anderson, Jorge J. Rocca, Mario C. Marconi, 2006, SPIE Advanced Lithography.

Direct spatial-temporal observation of Barkhausen avalanche in low-dimensional ferromagnetic system (Invited Paper)

Peter Fischer, Sug-Bong Choe, Weilun Chao, 2005, SPIE International Symposium on Fluctuations and Noise.

The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope

Farhad Salmassi, Iacopo Mochi, Erik H. Anderson, 2013, Photomask Technology.

Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2016 .

Emulation of anamorphic imaging on the SHARP EUV mask microscope

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2016, SPIE Advanced Lithography.

Phase-enhanced defect sensitivity for EUV mask inspection

Kenneth A. Goldberg, Patrick P. Naulleau, Andrew R. Neureuther, 2014, Photomask Technology.

Toward sub-10-nm resolution zone plates using the overlay nanofabrication processes

Dong Hyun Kim, Weilun Chao, Erik H. Anderson, 2008, SPIE MOEMS-MEMS.

Experimental analysis of high-resolution soft x-ray microscopy

David T. Attwood, Bruce Harteneck, Gregory Denbeaux, 2001, SPIE Optics + Photonics.

Achieving diffraction-limited performance on the Berkeley MET5

Carl Cork, Wenhua Zhu, Patrick Naulleau, 2019, Advanced Lithography.

Reliable characterization of materials and nanostructured systems <<50nm using coherent EUV beams

Weilun Chao, Lei Jiang, Kathleen Hoogeboom-Pot, 2016, SPIE Advanced Lithography.

Characterization and imaging of nanostructured materials using tabletop extreme ultraviolet light sources

Weilun Chao, Charles Bevis, Robert Karl, 2018, Advanced Lithography.

Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection

Kenneth A. Goldberg, Patrick P. Naulleau, Antoine Wojdyla, 2015, Advanced Lithography.

Binary pseudorandom array test standard optimized for characterization of large field-of-view optical interferometers

Valeriy V. Yashchuk, Sergey Babin, Allen Roginsky, 2020, Optical Engineering + Applications.

New nanofabrication technique using overlay for 15-nm zone plate

Erik H. Anderson, David T. Attwood, Bruce Harteneck, 2006, SPIE MOEMS-MEMS.

Equivalent multilayer bandwidth and comparison between 13.4 nm and 14.4 nm for EUV throughput calculation

Eric M. Gullikson, David T. Attwood, Weilun Chao, 2001, SPIE Advanced Lithography.

Efficient Fresnel zoneplate pattern data preparation for high-resolution nanofabrication

Patrick P. Naulleau, Ryan Miyakawa, Weilun Chao, 2017 .

Comparative analysis of shot noise in EUV and e-beam lithography

Patrick P. Naulleau, Andrew R. Neureuther, Weilun Chao, 2014, Advanced Lithography.

Revealing beam-induced chemistry using modulus mapping in negative-tone EUV/e-beam resists with and without cross-linker additives

Weilun Chao, Scott Dhuey, Deirdre L. Olynick, 2015, Advanced Lithography.

Upgrade to the SHARP EUV mask microscope

Markus P. Benk, Ryan Miyakawa, Weilun Chao, 2019, Advanced Lithography.

Analysis of spatial resolution and coherence demands in soft x-ray image-plane holographic microscopy with two zone plates

Erik H. Anderson, Weilun Chao, Carmen S. Menoni, 2013, Optics & Photonics - Optical Engineering + Applications.

Increased depth of field through wave-front coding: using an off-axis zone plate lens with cubic phase modulation in an EUV microscope

Kenneth A. Goldberg, Iacopo Mochi, Markus P. Benk, 2013, Photomask Technology.

A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope

Kenneth A. Goldberg, Antoine Wojdyla, Yow-Gwo Wang, 2014, Photomask Technology.

Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2016, Photomask Japan.

Nanometer-scale imaging with compact soft x-ray lasers

Erik H. Anderson, Jorge J. Rocca, Mario C. Marconi, 2005, SPIE Optics + Photonics.

Design and demonstration of tunable soft x-ray lateral shearing and Hartmann wavefront sensors

Kenneth A. Goldberg, Antoine Wojdyla, Mourad Idir, 2018, Optical Engineering + Applications.

Mechanical and thermal properties of nanomaterials at sub-50nm dimensions characterized using coherent EUV beams

Weilun Chao, Erik Anderson, Emrah Turgut, 2015, Advanced Lithography.

High spatial resolution full-field microscopy using a desktop-size soft x-ray laser

Erik H. Anderson, Jorge J. Rocca, Mario C. Marconi, 2007, SPIE Optical Engineering + Applications.

Design and implementation of precise x-ray metrology to control a 45-cm long x-ray deformable mirror

Weilun Chao, Lisa A. Poyneer, Jun Feng, 2016, Optical Engineering + Applications.

Advances in full field microscopy with table-top soft x-ray lasers

Kenneth A. Goldberg, Yong Wang, Erik H. Anderson, 2009, Optical Engineering + Applications.

Analysis of shot noise limitations due to absorption count in EUV resists

Patrick P. Naulleau, Andrew R. Neureuther, Weilun Chao, 2015, Advanced Lithography.

Collaborative development of diffraction-limited beamline optical systems at US DOE light sources

Kenneth A. Goldberg, Antoine Wojdyla, Mourad Idir, 2019, Optical Engineering + Applications.

Actinic mask imaging: recent results and future directions from the SHARP EUV microscope

Iacopo Mochi, Antoine Wojdyla, Weilun Chao, 2014, Advanced Lithography.

Taking a SHARP look at mask 3D effects

Patrick Naulleau, Markus P. Benk, Ryan Miyakawa, 2017, Photomask Technology.

Nanoscale ablation with soft x-ray lasers

Jorge J. Rocca, Carmen S. Menoni, David T. Attwood, 2007, SPIE Optical Engineering + Applications.

How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive

Carl Cork, Wenhua Zhu, Chris Anderson, 2020, Advanced Lithography.

Soft x-ray ablation mass spectrometry: high sensitivity elemental trace analysis

Jorge J. Rocca, Carmen S. Menoni, Weilun Chao, 2017, Optics + Optoelectronics.

Flash extreme ultraviolet holographic microscopy in a table top setup

Ganesh Balakrishnan, Weilun Chao, Erik Anderson, 2014, Photonics West - Biomedical Optics.

Binary pseudo-random array test standard optimized for characterization of interferometric microscopes

Valeriy V. Yashchuk, Simon Rochester, Stefano Cabrini, 2021, Optical Engineering + Applications.

Single-shot extreme ultraviolet laser imaging of nanostructures with wavelength resolution.

Przemyslaw Wachulak, Weilun Chao, Fernando Brizuela, 2008, Optics letters.

Analysis of extreme ultraviolet microscopy images of patterned nanostructures based on a correlation method

Randy A. Bartels, Erik H. Anderson, Jorge J. Rocca, 2008 .

Sub-nanosecond signal propagation in anisotropy-engineered nanomagnetic logic chains

Jeongmin Hong, Jeffrey Bokor, Weilun Chao, 2014, Nature Communications.

Metrology for the Advancement of X-ray Optics at the ALS

Valeriy V. Yashchuk, Kenneth A. Goldberg, Howard A. Padmore, 2013 .

Creating an EUV mask microscope for lithography generations reaching 8 NM

Kenneth A. Goldberg, Carl W. Cork, Patrick P. Naulleau, 2012 .

Soft x-ray microscopy to 25 nm with applications to biology and magnetic materials

David T. Attwood, Weilun Chao, Carolyn A. Larabell, 2001 .

Magnetic soft x-ray microscopy at 15 nm resolution probing nanoscale local magnetic hysteresis "invited…

Sung-Chul Shin, Erik H. Anderson, Sug-Bong Choe, 2006 .

A new regime of nanoscale thermal transport: Collective diffusion increases dissipation efficiency

Weilun Chao, Ronggui Yang, Damiano Nardi, 2014, Proceedings of the National Academy of Sciences.

Stochastics and EUV Patterning in the 1x-nm Regime

Patrick P. Naulleau, Andrew R. Neureuther, Christopher N. Anderson, 2016 .

Soft X-ray microscopy of nanomagnetism

Erik H. Anderson, David T. Attwood, Weilun Chao, 2006 .

Full field tabletop EUV coherent diffractive imaging in a transmission geometry.

Farhad Salmassi, Weilun Chao, Bosheng Zhang, 2013, Optics express.

Demonstration of Nanomachining With Focused Extreme Ultraviolet Laser Beams

B. T. Szapiro, Weilun Chao, M. C. Marconi, 2012, IEEE Journal of Selected Topics in Quantum Electronics.

Demonstration of 20 nm half-pitch spatial resolution with soft x-ray microscopy

Farhad Salmassi, David T. Attwood, Bruce Harteneck, 2003 .

The influence of sub-100 nm scattering on high-energy electron beam lithography

Erik H. Anderson, Bruce Harteneck, Eugene Veklerov, 2001 .

Patterning of defect arrays with e-beam lithography used to develop a high throughput e-beam defect inspection tool

John G. Hartley, Kevin Cummings, Weilun Chao, 2015 .

EUV Resists: Pushing to the Extreme

Patrick P. Naulleau, Mark Neisser, Andrew R. Neureuther, 2014 .

Demonstration of 12 nm resolution Fresnel zone plate lens based soft x-ray microscopy.

Weilun Chao, Senajith Rekawa, Peter Fischer, 2009, Optics express.

Three-dimensional nanoscale molecular imaging by extreme ultraviolet laser ablation mass spectrometry

Mark Woolston, Weilun Chao, Feng Dong, 2015, Nature Communications.

Full Characterization of the Mechanical Properties of 11-50 nm Ultrathin Films: Influence of Network Connectivity on the Poisson's Ratio.

Weilun Chao, Damiano Nardi, Marie Tripp, 2017, Nano letters.

Studying Resist Stochastics with the Multivariate Poisson Propagation Model

Patrick P. Naulleau, Andrew R. Neureuther, Christopher N. Anderson, 2014 .

Tabletop single-shot extreme ultraviolet Fourier transform holography of an extended object.

Ganesh Balakrishnan, Weilun Chao, Huiwen Xu, 2013, Optics express.

Nanofabrication and diffractive optics for high-resolution x-ray applications

Erik H. Anderson, David T. Attwood, Bruce Harteneck, 2000 .