Eric Gullikson

Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab

Farhad Salmassi, Carl Cork, Wenhua Zhu, 2019, Advanced Lithography.

EUV actinic defect inspection and defect printability at the sub-32-nm half-pitch

Sungmin Huh, Iacopo Mochi, Stefan Wurm, 2009, European Mask and Lithography Conference.

Accelerating EUV learning with synchrotron light: mask roughness challenges ahead

Iacopo Mochi, Abbas Rastegar, Brittany McClinton, 2011, Photomask Technology.

Mask defect verification using actinic inspection and defect mitigation technology

Sungmin Huh, Iacopo Mochi, Stefan Wurm, 2009, Advanced Lithography.

Application of phase shift focus monitor in EUVL process control

Sudhar Raghunathan, Iacopo Mochi, Vibhu Jindal, 2013, Advanced Lithography.

Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5

Dominic Ashworth, Regina Soufli, Michael Goldstein, 2013, Advanced Lithography.