Daniel Zehm

Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab

Farhad Salmassi, Carl Cork, Wenhua Zhu, 2019, Advanced Lithography.

The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope

Farhad Salmassi, Iacopo Mochi, Erik H. Anderson, 2013, Photomask Technology.

Commissioning an EUV mask microscope for lithography generations reaching 8 nm

Kenneth A. Goldberg, Eric M. Gullikson, Carl W. Cork, 2013, Advanced Lithography.

How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive

Carl Cork, Wenhua Zhu, Chris Anderson, 2020, Advanced Lithography.