I. Pollentier

发表

Line edge roughness: characterization, modeling and impact on device behavior

W. Sansen, S. Decoutere, J. Croon, 2002, Digest. International Electron Devices Meeting,.

Epitaxial lift-off GaAs LEDs to Si for fabrication of opto-electronic integrated circuits

P. Demeester, R. Baets, I. Pollentier, 1990 .

Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

Ivan Pollentier, Andrew K. Whittaker, Idriss Blakey, 2011 .

Epitaxial lift-off and its applications

Piet Demeester, P. Van Daele, C. Brys, 1993 .

Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists

Ivan Pollentier, Andrew K. Whittaker, Idriss Blakey, 2011 .

Relaxed lattice-mismatched growth of III–V semiconductors

P. Demeester, I. Moerman, I. Pollentier, 1991 .

Intrawafer CD control in state-of-the-art lithography

Kurt G. Ronse, Ivan Pollentier, Grozdan Grozev, 1999, Advanced Lithography.

Challenges in patterning 45nm node multiple-gate devices and SRAM cells

Vincent Wiaux, Rita Rooyackers, Staf Verhaegen, 2004 .

Integration of tall triple-gate devices with inserted TaxNy gate in a 0.274µm2 6T-SRAM cell and advanced CMOS logic circuits

Vincent Wiaux, Geert Vandenberghe, Patrick Jaenen, 2005 .

Integration of Cu and low- k dielectrics: effect of hard mask and dry etch on electrical performance of damascene structures

G. Beyer, K. Maex, M. Stucchi, 2001 .

Recent Progress in ArF Lithography for the 100nm Node.

G. Vandenberghe, M. Maenhoudt, I. Pollentier, 2001 .

Self-Assembled Monolayers as Inhibitors for Area-Selective Deposition: A Novel Approach towards Resist-less EUV Lithography

I. Pollentier, T. Conard, S. De Gendt, 2022, Applied Surface Science.

Effect of molecular weight on the EUV-printability of main chain scission type polymers

R. Fallica, I. Pollentier, D. de Simone, 2020 .

Feasibility of unzipping polymer polyphthalaldehyde for extreme ultraviolet lithography

Danilo De Simone, Ivan Pollentier, Stefan De Gendt, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

SIMS Analysis of Thin EUV Photoresist Films.

A. Franquet, I. Pollentier, V. Spampinato, 2022, Analytical chemistry.

Carbon nanotube EUV pellicle tunability and performance in a scanner-like environment

Marina Y. Timmermans, Cedric Huyghebaert, Ivan Pollentier, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

CNT EUV pellicle tunability and performance in a scanner-like environment

Marina Y. Timmermans, Cedric Huyghebaert, Ivan Pollentier, 2021, Advanced Lithography.

Free-standing carbon nanotube films for extreme ultraviolet pellicle application

Ivan Pollentier, Marina Y. Timmermans, Cedric Huyghebaert, 2018, Journal of Micro/Nanolithography, MEMS, and MOEMS.

CNTs in the context of EUV pellicle history

Jae Uk Lee, Marina Y. Timmermans, Christoph Adelmann, 2018, Advanced Lithography.

CNT EUV pellicle: moving towards a full-size solution

Ivan Pollentier, Marina Y. Timmermans, Christoph Adelmann, 2017, Photomask Technology.

Novel membrane solutions for the EUV pellicle: better or not?

Ivan Pollentier, Jae Uk Lee, Marina Y. Timmermans, 2017, Advanced Lithography.

EUV scattering from CNT pellicles: measurement and control

Marina Y. Timmermans, Cedric Huyghebaert, Sascha Brose, 2021, Advanced Lithography.

Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems

I. Pollentier, Ashish Rathore, S. De Gendt, 2021 .

Readiness of EUV Lithography for Insertion into Manufacturing: The IMEC EUV Program

G. Vandenberghe, I. Pollentier, R. Gronheid, 2013 .

Recent developments in relaxed and strained lattice mismatched heterostructures

P. Demeester, I. Moerman, I. Pollentier, 1991 .

Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern

Ivan Pollentier, Roel Gronheid, Kathleen Nafus, 2012 .

The EUV CNT pellicle: balancing material properties to optimize performance

Ivan Pollentier, Marina Y. Timmermans, Cedric Huyghebaert, 2020, Advanced Lithography.

A 0.314/spl mu/m/sup 2/ 6T-SRAM cell build with tall triple-gate devices for 45nm applications using 0.75NA 193nm lithography

R. Rooyackers, M. Van Hove, K. Ronse, 2004, IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004..

Properties and performance of EUVL pellicle membranes

Jae Uk Lee, Christoph Adelmann, Houman Zahedmanesh, 2015, SPIE Photomask Technology.

CNT pellicles: recent optimization and exposure results

J. Bekaert, I. Pollentier, E. Gallagher, 2023, Advanced Lithography.

EUV pellicle scanner integration for N2 nodes and beyond

J. Bekaert, I. Pollentier, E. Gallagher, 2023, Advanced Lithography.