D. Vender

发表

The application of the helicon source to plasma processing

R. Boswell, A. Perry, D. Vender, 1991 .

Three mistakes about the senses

D. Vender, 2010 .

Investigation of selective SiO2‐to‐Si etching in an inductively coupled high‐density plasma using fluorocarbon gases

D. Vender, G. Oehrlein, O. Joubert, 1994 .

Is Balancing Emblematic of Action?

D. Vender, 2011 .

Negative Ions in low pressure discharges

D. Vender, G. Kroesen, M. Haverlag, 1995 .

Transport of argon ions in an inductively coupled high-density plasma reactor

Gmw Gerrit Kroesen, D. Vender, G. Kroesen, 1997 .

On the ion energy transfer to the substrate during titanium deposition in a hollow cathode arc discharge

D. Vender, H. Kersten, H. Steffen, 1995 .

Plasma ionization through wave-particle interaction in a capacitively coupled radio-frequency discharge

R. Boswell, D. Vender, U. Czarnetzki, 2007 .

Ellipsometric study of silicon surface damage in electron cyclotron resonance plasma etching using CF4 and SF6

D. Vender, G. Oehrlein, M. Haverlag, 1992 .

Global model for an rf hydrogen inductive plasma discharge in the deuterium negative ion source experiment including negative ions

D. Vender, R. Zorat, 2000 .

Novel technique for the extraction of ionization profiles from spatial density measurements

D. Vender, M. Turner, C. M. Deegan, 2001 .

Is Balancing Emblematic of Action? Two or Three Pointers from Reid and Peirce

D. Vender, 2011 .

Simulation of pulsed electropositive and electronegative plasmas

R. Boswell, D. Vender, 1991 .

The effect of the addition of noble gases on H- production in a dc filament discharge in hydrogen

D. Vender, B. James, N. Curran, 2000 .

Negative ions in a CCl2F2 radio frequency discharge

D. Vender, G. Kroesen, W. Stoffels, 1995 .

Global model of a radiofrequency H2 plasma in DENISE

D. Vender, J. Goss, R. Zorat, 2000 .

Simulations of multipactor‐assisted breakdown in radio frequency plasmas

R. Boswell, D. Vender, Helen B. Smith, 1996 .

Electron-sheath interaction in capacitive radio-frequency plasmas

R. Boswell, D. Vender, R. W. Boswell, 1992 .

Fluorocarbon high‐density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF3

Olivier Joubert, Gottlieb S. Oehrlein, David Vender, 1994 .

Fluorocarbon high‐density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3

Ying Zhang, Gottlieb S. Oehrlein, David Vender, 1994 .

Collisionless electron heating by capacitive rf sheaths.

D. Vender, M. Turner, G. Gozadinos, 2001, Physical review letters.

Bohm velocity with a two-temperature distribution of negative particles

A. Lichtenberg, R. Boswell, D. Vender, 1992 .

Laser-particulate interactions in a dusty RF plasma

D. Vender, W. Stoffels, E. Stoffels, 1994 .

An experimental study of breakdown in a pulsed Helicon plasma

R. Boswell, D. Vender, 1995 .

Anomalous skin effect and collisionless power dissipation in inductively coupled discharges

D. Vender, M. Turner, G. Cunge, 2001 .

Pre-disruption MHD activity in the LT-4 tokamak

A. H. Morton, D. Vender, H. Kuwahara, 1987 .

Characterization of the E to H transition in a pulsed inductively coupled plasma discharge with internal coil geometry: bi-stability and hysteresis

D. Vender, M. Turner, G. Cunge, 1999 .

Ion‐induced fluorination in electron cyclotron resonance etching of silicon studied by x‐ray photoelectron spectroscopy

D. Vender, G. Oehrlein, M. Haverlag, 1992 .

Sidewall passivation during the etching of poly‐Si in an electron cyclotron resonance plasma of HBr

D. Vender, G. Oehrlein, M. Haverlag, 1994 .

Collisionless electron heating by capacitive radio-frequency plasma sheaths

M. Lieberman, D. Vender, M. Turner, 2001 .

Measurement of the electron energy distribution function in an argon radio-frequency discharge in the γ mode

D. Vender, J. Goss, M. Hopkins, 1999 .