O. R. Wood

发表

Photoionization-Pumping Of Sodium Vapor With The Lawrence Livermore National Laboratory Soft-X-Ray Laser

O. R. Wood, W. T. Silfvast, J. E. Trebes, 1987, Optics & Photonics.

Synchrotron Radiation Sources for EUVL Applications

A. A. MacDowell, O. R. Wood, 2006 .

PASSIVE Q‐SWITCHING OF A CO2 LASER

O. R. Wood, S. E. Schwarz, S. Schwarz, 1967 .

Diffraction-limited soft x-ray projection lithography with a laser plasma source

Richard H. Stulen, Michael E. Malinowski, David L. Windt, 1991 .

Comparison of actinic and non-actinic inspection of programmed-defect masks

O. R. Wood, 2006 .

Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks

D. L. White, Donald M. Tennant, O. R. Wood, 1999 .

Phase‐measuring interferometry using extreme ultraviolet radiation

A. A. MacDowell, Donald M. Tennant, O. R. Wood, 1995 .

Reflective mask technologies and imaging results in soft x‐ray projection lithography

David L. Windt, D. L. White, L. Eichner, 1991 .

Reduction imaging at 14 nm using multilayer‐coated optics: Printing of features smaller than 0.1 μm

David L. Windt, Jeffrey Bokor, D. L. White, 1990 .

Lithographic projectors with dark-field illumination

D. L. White, Raymond A. Cirelli, O. R. Wood, 1999 .

Tenth micron lithography with a 10 Hz 37.2 nm sodium laser

W. T. Silfvast, O. R. Wood, O. Wood, 1988 .

Defect repair for soft x‐ray projection lithography masks

David L. Windt, A. A. MacDowell, Donald M. Tennant, 1992 .

Short‐wavelength annular‐field optical system for imaging tenth‐micron features

Tanya E. Jewell, W. T. Silfvast, O. R. Wood, 1989 .

PASSIVE MODE LOCKING OF A CO2 LASER

O. R. Wood, S. E. Schwarz, S. Schwarz, 1968 .

Use of attenuated phase masks in extreme ultraviolet lithography

D. L. White, A. A. MacDowell, Donald M. Tennant, 1997 .