H. Shite

Understanding RLS limitations for EUV pre-production stages ; impact of resist dissolution

Brian H Head, C. Fonseca, H. Shite, 2010 .

Resolution–linewidth roughness–sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist

Joshua S. Hooge, A. V. Pret, B. Rathsack, 2011 .

EUV RLS performance tradeoffs for a polymer bound PAG resist

Alessandro Vaglio Pret, Roel Gronheid, Kathleen Nafus, 2010, Advanced Lithography.

Understanding EUV resist dissolution characteristics and its impact to RLS limitations

Carlos Fonseca, Roel Gronheid, Gustaf Winroth, 2011, Advanced Lithography.

Further investigation of EUV process sensitivities for wafer track processing

E. Hendrickx, J. Kitano, K. Nafus, 2010, Advanced Lithography.