C. Ortolland
发表
S. Narasimha,
K. Onishi,
J. Johnson,
2012,
2012 International Electron Devices Meeting.
T. Schram,
A. Veloso,
M. Jurczak,
2008,
2008 Symposium on VLSI Technology.
R. Rooyackers,
Liesbeth Witters,
C. Ortolland,
2009,
2009 Proceedings of ESSCIRC.
Rita Rooyackers,
Liesbeth Witters,
C. Ortolland,
2009,
ESSDERC 2009.
P. Stolk,
F. Leverd,
F. Arnaud,
2006,
2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers..
V. Fiori,
S. Orain,
C. Ortolland,
2007,
IEEE Transactions on Electron Devices.
A. Hikavyy,
E. Rosseel,
T. Schram,
2010,
2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP).
Pierre Morin,
C. Ortolland,
Franck Arnaud,
2006
.
T. Skotnicki,
S. Monfray,
F. Boeuf,
2003
.
Pierre Morin,
S. Orain,
C. Ortolland,
2006
.
Tensile Contact Etch Stop Nitride for nMOS Performance Enhancement: Influence of the Film Morphology
K. Barla,
F. Arnaud,
C. Ortolland,
2006
.
C. Cabral,
M. Frank,
C. Ortolland,
2016,
IEEE Electron Device Letters.
Wen Liu,
Claude Ortolland,
Andreas Kerber,
2018,
2018 IEEE International Reliability Physics Symposium (IRPS).
Paul C. Parries,
Giuseppe La Rosa,
Scott R. Stiffler,
2018,
IBM J. Res. Dev..
Liesbeth Witters,
Serge Biesemans,
Stefan Kubicek,
2010
.
R. Dittrich,
L. Ragnarsson,
B. Parvais,
2009,
2009 Proceedings of ESSCIRC.