C. Vartuli

发表

Practical implications of via-middle Cu TSV-induced stress in a 28nm CMOS technology for Wide-IO logic-memory interconnect

J. West, Y. S. Choi, C. Vartuli, 2012, 2012 Symposium on VLSI Technology (VLSIT).

High temperature electron cyclotron resonance etching of GaN, InN, and AlN

S. Pearton, C. Abernathy, C. Vartuli, 1995 .

Scanning transmission electron microscopy study of Au/Zn/Au/Cr/Au and Au/Ti/Pt/Au/Cr/Au contacts to p-type InGaAs/InP

C. Vartuli, J. Huang, 2003 .

The effect of Cr barrier on interfacial reaction of Au/Zn/Au/Cr/Au contacts to p-type InGaAs/InP

C. Vartuli, J. Huang, J. Huang, 2004 .

High rate electron cyclotron resonance etching of GaN, InN, and AlN

A. J. Howard, S. Pearton, C. Abernathy, 1995 .

Ion implantation doping and isolation of GaN

John C. Zolper, Stephen J. Pearton, R. A. Stall, 1995 .

Nitrogen and fluorine ion implantation in InxGa1−xN

J. Zolper, S. Pearton, C. Abernathy, 1995 .

Implant isolation of InxAl1−xN and InxGa1−xN

J. Zolper, S. Pearton, C. Abernathy, 1995 .

Unintentional hydrogenation of GaN and related alloys during processing

F. Ren, S. Pearton, J. Lee, 1996 .

High density plasma etching of III–V nitrides

A. J. Howard, S. Pearton, C. Abernathy, 1996 .

Wet chemical etching of AlN and InAlN in KOH solutions

John C. Zolper, R. J. Shul, Stephen J. Pearton, 1996 .

Etching processes for fabrication of GaN/InGaN/AlN microdisk laser structures

J. Zolper, S. Pearton, J. Lee, 1996 .

ICl/Ar electron cyclotron resonance plasma etching of III–V nitrides

S. Pearton, C. Abernathy, C. Vartuli, 1996 .

Cl2/Ar and CH4/H2/Ar dry etching of III–V nitrides

S. Pearton, J. Lee, C. Abernathy, 1996 .

Plasma etching of III-nitrides in ICl/Ar and IBr/Ar plasmas

S. Pearton, J. Lee, C. Abernathy, 1997 .

Effect of dry etching on surface properties of III-nitrides

R. F. Karlicek, F. Ren, S. Pearton, 1997 .

Electron cyclotron resonance etching of III-V nitrides in IBr/Ar plasmas

S. Pearton, J. Lee, C. Abernathy, 1997 .

Inductively coupled plasma etching of III-V nitrides in CH{sub 4}/H{sub 2}/Ar and CH{sub 4}/H{sub 2}/N{sub 2} chemistries

S. Pearton, J. Lee, C. Abernathy, 1997 .

Low bias dry etching of III-nitrides in Cl2-based inductively coupled plasmas

S. Pearton, C. Abernathy, C. Vartuli, 1998 .

Comparison of inductively coupled plasma Cl2 and Cl4/H2 etching of III-nitrides

S. Pearton, C. Abernathy, C. Vartuli, 1998 .

Conduction mechanisms in W and WSix ohmic contacts to InGaN and InN

M. L. Lovejoy, F. Ren, J. Zolper, 1997 .

Current transport in W and WSI{sub x} ohmic contacts to InGaN and InN

S. Pearton, C. Abernathy, C. Vartuli, 1997 .

W, WSi{sub x} and Ti/Al low resistance OHMIC contacts to InGaN, InN and InAlN

M. L. Lovejoy, J. Zolper, S. Pearton, 1996 .

Electron Cyclotron Resonance Plasma Etching of AlGaN in Cl2/Ar and BCl3/Ar Plasmas

S. Pearton, D. Greve, J. Lee, 1997 .

Comparison of ICl and IBr for Dry Etching of III-Nitrides

S. Pearton, J. Lee, C. Abernathy, 1996 .

Plasma damage effects in InAlN field effect transistors

F. Ren, S. Pearton, C. Abernathy, 1996 .

Cl2-based dry etching of the AlGaInN system in inductively coupled plasmas

S. Pearton, J. Han, C. Abernathy, 1998 .

Cl{sub 2}-based dry etching of the AlGaInN system in inductively coupled plasmas

S. Pearton, J. Han, C. Abernathy, 1997 .

Plasma‐induced damage of GaAs during etching of refractory metal contacts

M. L. Lovejoy, J. Zolper, C. Vartuli, 1995 .

C implantation and surface degradation of InGaP

A. J. Howard, J. Zolper, S. Pearton, 1996 .

Temperature dependent electron cyclotron resonance etching of InP, GaP, and GaAs

A. J. Howard, C. Vartuli, R. Shul, 1996 .

Application of focused ion beam lift‐out specimen preparation to TEM, SEM, STEM, AES and SIMS analysis

C. Vartuli, L. Giannuzzi, R. B. Irwin, 2001 .

Comparison of Elemental Detection Using Microcalorimetry, SIMS, AES and EDS (SEM, STEM, and TEM)

C. Vartuli, R. B. Irwin, D. Wollman, 2000, Microscopy and Microanalysis.

FIB lift-out STEM failure analysis technique

C. Vartuli, F. Stevie, 2002, Proceedings of the 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits (Cat. No.02TH8614).

Enhancement of SEM/EDS Analysis Using FIB Sample Preparation

C. Vartuli, J. Bindell, F. Stevie, 1999, Microscopy and Microanalysis.

Correlation of resistance and interfacial reaction of contacts to n -type InP

C. Vartuli, N. Bar-chaim, J. Huang, 2002 .

Novel resistance reduction and phase changes of contacts to n-type InP by rapid thermal annealing

C. Vartuli, N. Bar-chaim, J. Shearer, 2002 .

Applications of Automated High Resolution Strain Mapping in TEM on the Study of Strain Distribution in MOSFETs

C. Vartuli, S. Nicolopoulos, T. Aoki, 2014 .

Chlorine-Based Plasma Etching of GaN

R. D. Briggs, S. Pearton, J. Lee, 1996 .

Wet chemical etching survey of III-nitrides

John C. Zolper, Stephen J. Pearton, C. R. Abernathy, 1997 .

Effect of BCl3 Dry Etching on InAlN Surface Properties

C. R. Abernathy, F. Ren, S. Pearton, 1996 .

Layout Variation Effects in Advanced MOSFETs: STI-Induced Embedded SiGe Strain Relaxation and Dual-Stress-Liner Boundary Proximity Effect

Greg Baldwin, Jayhoon Chung, C. Vartuli, 2010, IEEE Transactions on Electron Devices.

High temperature surface degradation of III–V nitrides

John C. Zolper, Stephen J. Pearton, C. R. Abernathy, 1996 .

Patterning of GaN in High-Density Cl 2 - and BCl 3 -Based Plasmas

R. D. Briggs, S. Pearton, M. Ludowise, 1997 .

Ion implantation and rapid thermal processing of Ill-V nitrides

J. Zolper, C. Abernathy, C. Vartuli, 1996 .

High Resistivity InAIN by Nitrogen or Oxygen Implantation

J. Zolper, S. Pearton, C. Abernathy, 1995 .

Diffusion of Implanted Dopants and Isolation Species in III-V Nitrides

S. Pearton, C. Abernathy, C. Vartuli, 1994 .

The incorporation of hydrogen into III-V nitrides during processing

C. R. Abernathy, J. Lee, C. Vartuli, 1996 .

Plasma chemistry dependent ECR etching of GaN

A. J. Howard, S. Pearton, C. Abernathy, 1995 .

Dry etching and implantation characteristics of III-N alloys

J. Zolper, S. Pearton, C. Vartuli, 1995 .

Hydrogen Diffusion and Passivation in InGaAIN Alloys

S. Pearton, C. Abernathy, C. Vartuli, 1995 .

Role of C, O and H in III-V Nitrides

J. Zolper, S. Pearton, J. Lee, 1995 .

Implantation and redistribution of dopants and isolation species in GaN and related compounds

S. Pearton, C. Abernathy, C. Vartuli, 1995 .

Advances in near field holographic grating mask technology

U. Koren, Donald M. Tennant, K. Dreyer, 1994 .