K. Hamamoto

发表

Reducing off Hydrocarbon Contaminants for EUVL

Yuzuru Tanaka, K. Hamamoto, H. Tsubakino, 2005 .

Actinic Mask Inspection Using an EUV Microscope –Preparation of a Mirau Interferometer for Phase-Defect Detection–

Yuzuru Tanaka, K. Hamamoto, Takeo Watanabe, 2005 .

Phase Defect Observation Using Extreme Ultraviolet Microscope

Yuzuru Tanaka, K. Hamamoto, Takeo Watanabe, 2006 .

Development of the large field extreme ultraviolet lithography camera

S. Okazaki, K. Hamamoto, Takeo Watanabe, 2000 .

Cleaning Characteristics of Contaminated Imaging Optics Using 172 nm Radiation

Hiroo Kinoshita, Morio Hosoya, Noriyuki Sakaya, 2007 .

Outgassing Characteristics of Structural Materials and the Removal of Contaminants from EUVL Masks using 172-nm Radiation

Yuzuru Tanaka, K. Hamamoto, Takeo Watanabe, 2004 .

Cleaning of extreme ultraviolet lithography optics and masks using 13.5nm and 172nm radiation

K. Hamamoto, Takeo Watanabe, H. Kinoshita, 2005 .

Mitigation of Low Outgassing and Small Line Edge Roughness for EUVL Resist

Hiroo Kinoshita, Hideo Hada, Hiroshi Komano, 2004 .

Mask defect inspection using an extreme ultraviolet microscope

Hiroo Kinoshita, Morio Hosoya, Tsutomu Shoki, 2005 .

Actinic mask metrology for extreme ultraviolet lithography

Masayuki Endo, Hiroo Kinoshita, Tsuneyuki Haga, 2004 .

Development of Nanometer Resolution Focus Detector in Vacuum for Extreme Ultraviolet Microscope

Hiroo Kinoshita, Kazuhiro Hamamoto, Takeo Watanabe, 2006 .