S. Woo

发表

The novel plasma etching process for defect reduction in photomask fabrication

Sang-Gyun Woo, Seong-Yong Moon, Ji-Hyun Lee, 2009, Photomask Japan.

Imaging characteristics and specification of mask mean-to-target and mask uniformity according to polarization status

S. W. Lee, J. Finders, S. Woo, 2005 .

Analysis method to determine and characterize the mask mean-to-target and uniformity specification

Jeroen Van de Kerkhove, Han-Ku Cho, Joo-Tae Moon, 2006, European Mask and Lithography Conference.

Effects of gas ring position and mesh introduction on film quality and thickness uniformity

Sang-Gyun Woo, Young-Bum Koh, Byeong-Soo Bae, 1997 .

Attenuated phase-shifting masks of chromium aluminum oxide.

K. No, S. Woo, E. Kim, 1998, Applied optics.

Simulation and fabrication of attenuated phase-shifting masks: CrF(x).

K. No, S. Woo, E. Kim, 1997, Applied optics.

A simulation model for thickness profile of the film deposited using planar circular type magnetron sputtering sources

K. No, S. Woo, B. Bae, 1996 .

Fluorocarbon-based single-layer resist for 157-nm lithography

Woo-Sung Han, Sang-Gyun Woo, Kenji Honda, 2002, SPIE Advanced Lithography.

Study on the Properties of Interlayer Low Dielectric Polyimide during Cl-Based Plasma Etching of Aluminum

S. Woo, S. Kim, Jinho Ahn, 1999, Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference.

Single-layer halftone phase-shifting masks for DUV microlithography : optical property simulation and chromium compound film preparation

K. No, S. Woo, Seungbum Hong, 1997 .

Predicting conversion time of circuit design file by artificial neural networks

Ji-Hyeon Choi, Han-Ku Cho, Jee-Hyong Lee, 2008, SPIE Advanced Lithography.

Side-lobe suppression in halftone PSM with optical proximity correction

In-Gyun Shin, Woo-Sung Han, Sang-Gyun Woo, 1995, Photomask Technology.

Etching Characteristics of Fine Ta Patterns with Electron Cyclotron Resonance Chlorine Plasma

S. Woo, S. Kim, Jinho Ahn, 2000 .

Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Han-Ku Cho, Joo-Tae Moon, Sang-Gyun Woo, 2005, SPIE Advanced Lithography.

Defect printability and defect inspection simulations of patterned EUVL mask using rigorous coupled-wave analysis

Han-Ku Cho, Sang-Gyun Woo, Seong-Sue Kim, 2005, SPIE Advanced Lithography.

Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

Han-Ku Cho, Joo-Tae Moon, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Design and synthesis of new photoresist materials for ArF lithography

Joo-Tae Moon, Sang-Gyun Woo, Hyun-woo Kim, 2000, Advanced Lithography.

A Novel Platform for Production-worthy ArF Resist

J. Moon, Sang-jun Choi, Hyun-woo Kim, 2001 .

Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure

Sang-Gyun Woo, Eunah Kim, Young-Bum Koh, 1996, Photomask and Next Generation Lithography Mask Technology.

Study of the etching mechanism of tantalum thin films by argon actinometry

S. Woo, Jinho Ahn, Sanghoon Kim, 2002 .