G. McIntyre

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Scott Halle, Bernhard Kneer, Emily Gallagher, 2009, Advanced Lithography.

Characterizing polarized illumination in high numerical aperture optical lithography with phase shifting masks

G. McIntyre, Gregory Russell McIntyre, 2006 .

Phase shift mask interferometric birefringence monitor

A. Neureuther, G. McIntyre, 2006 .

Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations

Andrew R. Neureuther, Harry J. Levinson, Gregory McIntyre, 2006 .

Design Technology co-optimization for N10

Diederik Verkest, Naoto Horiguchi, Aaron Thean, 2014, Proceedings of the IEEE 2014 Custom Integrated Circuits Conference.

Inspection challenges for triple patterning at sub-14 nm nodes with broadband plasma inspection platforms

Sandip Halder, Kaushik Sah, Philippe Leray, 2015, 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

EUVL mask repair: expanding options with nanomachining

Gregory McIntyre, Roy White, Mark Lawliss, 2012, Photomask Technology.

Award-PM 12 EUVL mask repair : expanding options with nanomachining

G. McIntyre, E. Gallagher, M. Lawliss, 2013 .

IMEC N7, N5 and beyond: DTCO, STCO and EUV insertion strategy to maintain affordable scaling trend

Diederik Verkest, Kurt G. Ronse, Jae Uk Lee, 2018, Advanced Lithography.