M. Hibbs

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Scott Halle, Bernhard Kneer, Emily Gallagher, 2009, Advanced Lithography.

Optical Lithography at 248 nm

M. Hibbs, 1991 .

Masks for micro- and nanolithography

E. Gallagher, M. Hibbs, 2014 .

Optimum mask and source patterns to print a given shape

Kafai Lai, Scott J. Bukofsky, Alfred K. K. Wong, 2001, SPIE Advanced Lithography.