René Carpaij

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Scott Halle, Bernhard Kneer, Emily Gallagher, 2009, Advanced Lithography.

Supershear bursts in the propagation of a tensile crack in linear elastic material

P. Geubelle, J. Molinari, René Carpaij, 2018, Physical Review E.