E. Li

Interconnect thermal modeling for accurate simulation of circuittiming and reliability

Sung-Mo Kang, Elyse Rosenbaum, Erhong Li, 2000, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

Hot carrier induced degradation in deep submicron MOSFETs at 100 °C

Elyse Rosenbaum, E. Li, L. Register, 2000 .

Effect of nitrogen incorporation on PMOS negative bias temperature instability in ultrathin oxi-nitrides

V. Gopinath, E. Li, S. Prasad, 2003, IEEE International Integrated Reliability Workshop Final Report, 2003.

Deposition and Characterization of Polycrystalline Si1 − x Ge x Films for CMOS Transistors Gate Electrode Applications

Joyce C. Lin, V. Gopinath, E. Li, 2005 .

Anode hole injection versus hydrogen release: the mechanism for gate oxide breakdown

Elyse Rosenbaum, J. Wu, E. Li, 2000, 2000 IEEE International Reliability Physics Symposium Proceedings. 38th Annual (Cat. No.00CH37059).