Ryo Shimada

Calibrated PSCAR stochastic simulation

Geert Vandenberghe, Hans-Jürgen Stock, Peter De Bisschop, 2019, Advanced Lithography.

PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO)

Geert Vandenberghe, Hans-Jürgen Stock, Peter De Bisschop, 2019, Advanced Lithography.

Constructing a robust PSCAR process for EUV

G. Vandenberghe, K. Nafus, S. Biesemans, 2018, Advanced Lithography.