B. Meliorisz

Calibrated PSCAR stochastic simulation

Geert Vandenberghe, Hans-Jürgen Stock, Peter De Bisschop, 2019, Advanced Lithography.

Investigation of high-resolution contact printing

B. Meliorisz, P. Hudek, A. Erdmann, 2008 .

Optimization of illumination pupils and mask structures for proximity printing

B. Meliorisz, U. Hofmann, P. Hudek, 2010 .

Simulation of proximity and contact lithography

B. Meliorisz, A. Erdmann, P. Evanschitzky, 2007 .

Simulation of mask proximity printing

B. Meliorisz, A. Erdmann, 2007 .

PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO)

Geert Vandenberghe, Hans-Jürgen Stock, Peter De Bisschop, 2019, Advanced Lithography.