A. Sugiyama

High-precision contouring from SEM image in 32-nm lithography and beyond

Hiroyuki Shindo, Thuy Do, Ir Kusnadi, 2009, Advanced Lithography.

Advanced CD-SEM metrology for pattern roughness and local placement of lamellar DSA

Hiroshi Yoshida, Takeshi Kato, Yi Cao, 2014, Advanced Lithography.