J. van de Kerkhove

High-precision contouring from SEM image in 32-nm lithography and beyond

Hiroyuki Shindo, Thuy Do, Ir Kusnadi, 2009, Advanced Lithography.

Analysis method to determine and characterize the mask mean-to-target and uniformity specification

Jeroen Van de Kerkhove, Han-Ku Cho, Joo-Tae Moon, 2006, European Mask and Lithography Conference.

EUV low-n attenuated phase-shift mask on random logic via single patterning at pitch 36nm

Jae Uk Lee, J. van de Kerkhove, V. Philipsen, 2022, Advanced Lithography.